-
1
-
-
46049090421
-
Full integration of highly manufacturable 512Mb PRAM based on 90nm technology
-
J. H. Oh et al., "Full integration of highly manufacturable 512Mb PRAM based on 90nm technology," in IEDM Tech. Dig., pp. 49-52, 2006.
-
(2006)
IEDM Tech. Dig.
, pp. 49-52
-
-
Oh, J.H.1
-
2
-
-
77952396902
-
A 45nm generation phase change memory technology
-
G. Servalli, "A 45nm generation phase change memory technology," in IEDM Tech. Dig., pp. 5.7.1-5.7.4, 2009.
-
(2009)
IEDM Tech. Dig.
, pp. 571-574
-
-
Servalli, G.1
-
3
-
-
0842331309
-
Scaling analysis of phase-change memory technology
-
A. Pirovano, A. L. Lacaita, A. Benvenuti, F. Pellizzer, S. Hudgens, and R. Bez, "Scaling analysis of phase-change memory technology," in IEDM Tech. Dig., pp. 699-702, 2003.
-
(2003)
IEDM Tech. Dig.
, pp. 699-702
-
-
Pirovano, A.1
Lacaita, A.L.2
Benvenuti, A.3
Pellizzer, F.4
Hudgens, S.5
Bez, R.6
-
4
-
-
39749133763
-
Modeling of programming and read performance in phase-change memories - Part II: Program disturb and mixed-scaling approach
-
U. Russo, D. Ielmini, A. Redaelli, and A. L. Lacaita, "Modeling of programming and read performance in phase-change memories-Part II: Program disturb and mixed-scaling approach," IEEE Trans. Electron Devices, vol. 55, no. 2, pp. 515-522, 2008.
-
(2008)
IEEE Trans. Electron Devices
, vol.55
, Issue.2
, pp. 515-522
-
-
Russo, U.1
Ielmini, D.2
Redaelli, A.3
Lacaita, A.L.4
-
5
-
-
34548647299
-
Analytical model for subthreshold conduction and threshold switching in chalcogenide-based memory devices
-
D. Ielmini, and Y. Zhang, "Analytical model for subthreshold conduction and threshold switching in chalcogenide-based memory devices," J. Appl. Phys., vol. 102, p. 054517, 2007.
-
(2007)
J. Appl. Phys.
, vol.102
, pp. 054517
-
-
Ielmini, D.1
Zhang, Y.2
-
6
-
-
47349131110
-
Threshold switching mechanism by high-field energy gain in the hopping transport of chalcogenide glasses
-
D. Ielmini, "Threshold switching mechanism by high-field energy gain in the hopping transport of chalcogenide glasses," Phys. Rev. B, vol. 78, p. 035308, 2008.
-
(2008)
Phys. Rev. B
, vol.78
, pp. 035308
-
-
Ielmini, D.1
-
7
-
-
2442604559
-
Low-field amorphous state resistance and threshold voltage drift in chalcogenide materials
-
A. Pirovano, A. L. Lacaita, F. Pellizzer, S. A. Kostylev, A. Benvenuti, and R. Bez, "Low-field amorphous state resistance and threshold voltage drift in chalcogenide materials," IEEE Trans. Electron Devices, vol. 51, no. 5, pp. 714-719, 2004.
-
(2004)
IEEE Trans. Electron Devices
, vol.51
, Issue.5
, pp. 714-719
-
-
Pirovano, A.1
Lacaita, A.L.2
Pellizzer, F.3
Kostylev, S.A.4
Benvenuti, A.5
Bez, R.6
-
8
-
-
37549051695
-
Fundamental drift of parameters in chalcogenide phase change memory
-
I. V. Karpov, M. Mitra, D. Kau, G. Spadini, Y. A. Kryukov, and V. G. Karpov, "Fundamental drift of parameters in chalcogenide phase change memory," J. Appl. Phys., vol. 102, p. 124503, 2007.
-
(2007)
J. Appl. Phys.
, vol.102
, pp. 124503
-
-
Karpov, I.V.1
Mitra, M.2
Kau, D.3
Spadini, G.4
Kryukov, Y.A.5
Karpov, V.G.6
-
9
-
-
67349254101
-
Reliability impact of chalcogenide-structure relaxation in phase-change memory (PCM) cells - Part I: Experimental study
-
D. Ielmini, D. Sharma, S. Lavizzari, and A. L. Lacaita, "Reliability impact of chalcogenide-Structure relaxation in phase-change memory (PCM) cells-Part I: Experimental study," IEEE Trans. Electron Devices, vol. 56, no. 5, pp. 1070-1077, 2009.
-
(2009)
IEEE Trans. Electron Devices
, vol.56
, Issue.5
, pp. 1070-1077
-
-
Ielmini, D.1
Sharma, D.2
Lavizzari, S.3
Lacaita, A.L.4
-
10
-
-
67349157165
-
Reliability impact of chalcogenide-structure relaxation in phase-change memory (PCM) cells - Part II: Physics-based modelling
-
S. Lavizzari, D. Ielmini, D. Sharma, and A. L. Lacaita, "Reliability impact of chalcogenide-Structure relaxation in phase-change memory (PCM) cells-Part II: Physics-based modelling," IEEE Trans. Electron Devices, vol. 56, no. 5, pp. 1078-1085, 2009.
-
(2009)
IEEE Trans. Electron Devices
, vol.56
, Issue.5
, pp. 1078-1085
-
-
Lavizzari, S.1
Ielmini, D.2
Sharma, D.3
Lacaita, A.L.4
-
11
-
-
62149090549
-
Common signature of many-body thermal excitation in structural relaxation and crystallization of chalcogenide glasses
-
D. Ielmini and M. Boniardi, "Common signature of many-body thermal excitation in structural relaxation and crystallization of chalcogenide glasses," Appl. Phys. Lett., vol. 94, p. 091906, 2009.
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 091906
-
-
Ielmini, D.1
Boniardi, M.2
-
12
-
-
59849127367
-
Evidence of the thermo-electric thomson effect and influence on the program conditions and cell optimization in phase-change memory cells
-
D. Tio Castro et al., "Evidence of the thermo-electric thomson effect and influence on the program conditions and cell optimization in phase-change memory cells," in IEDM Tech Dig., pp. 35-38, 2007.
-
(2007)
IEDM Tech Dig.
, pp. 35-38
-
-
Tio Castro, D.1
-
13
-
-
44049087109
-
5
-
5," Appl. Phys. Lett., vol. 92, p. 193511, 2008.
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 193511
-
-
Ielmini, D.1
Lavizzari, S.2
Sharma, D.3
Lacaita, A.L.4
-
14
-
-
51949114502
-
Two-bit cell operation in diode-switch phase change memory cells with 90nm technology
-
D.-H. Kang et al., "Two-bit cell operation in diode-switch phase change memory cells with 90nm technology," in VLSI Symp. Tech. Dig., pp. 98-99, 2008.
-
(2008)
VLSI Symp. Tech. Dig.
, pp. 98-99
-
-
Kang, D.-H.1
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