Performances by the electron optical system of low energy electron beam proximity projection lithography tool with a large scanning field

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2754-2757

  Kasahara, Haruo ^a   Shishido, Tsutomu ^b   Samoto, Norihiko ^a   Shimazu, Nobuo ^a  

^a LEEPL Corporation   (Japan)

^b ACCRETECH   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; ELECTRIC SPACE CHARGE; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; SCANNING;

BEAM CURRENTS; ELECTRON OPTICAL SYSTEMS; HOLE PATTERNS; LITHOGRAPHY TOOLS;

OPTICAL SYSTEMS;

EID: 29044450416     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2062435     Document Type: Article

References (4)

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3. C. H. Scheafer, J. Vac. Sci. Technol. B 4, 1237 (1986).
4. E. Munro, J. Vac. Sci. Technol. B 15, 2692 (1997).