Integrity of functional self-assembled monolayers on hydrogen-terminated silicon-on-insulator wafers

Applied Surface Science

Volumn 257, Issue 4, 2010, Pages 1314-1318

  Tian, Fangyuan ^a   Ni, Chaoying ^a   Teplyakov, Andrew V ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

Self assembled monolayers (SAMs); Silicon on insulator (SOI); Surface modification; Transmission electron microscopy (TEM); X ray photoelectron spectroscopy (XPS)

Indexed keywords

DENSITY FUNCTIONAL THEORY; ENERGY CONVERSION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDROGEN; MICROELECTRONICS; PHOTOELECTRONS; PHOTONS; SELF ASSEMBLED MONOLAYERS; SILICON COMPOUNDS; SILICON ON INSULATOR TECHNOLOGY; SURFACE TREATMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMICALLY FLAT INTERFACES; FUNCTIONAL DEVICES; HYDROGEN-TERMINATED SILICON; ORGANIC MONOLAYERS; SAMS; SILICON ON INSULATOR (SOI); SILICON ON INSULATOR WAFERS; SINGLE CRYSTALLINE SILICON;

SILICON WAFERS;

EID: 77957134415     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.08.058     Document Type: Article

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