Ti-Al-Si-N films for superhard coatings deposited by reactive cosputtering using Ti, Al, and Si targets

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 1103-1107

  Miyamura, A ^a   Yamaguchi, M ^a   Hattori, K ^b   Sato, Y ^a   Nakamura, S ^a   Shigesato, Y ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELASTIC MODULI; MAGNETRON SPUTTERING; NANOCRYSTALLITES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

BERKOVICH DIAMOND INDENTERS; NANOCOMPOSITE STRUCTURES; TOTAL GAS PRESSURE;

TITANIUM COMPOUNDS;

EID: 34547354181     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2721577     Document Type: Article

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