Growth of (Zr,Ti)N thin films by ion-assisted dual D.C. reactive magnetron sputtering

Solid State Phenomena

Volumn 136, Issue , 2008, Pages 133-138

  Hodak, S K ^a   Seppanen T ^b   Tungasmita, S ^a  

^a CHULALONGKORN UNIVERSITY   (Thailand)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

(Zr,Ti)N coatings; Ion assisted; Magnetron sputtering

Indexed keywords

CHARGED PARTICLES; COATINGS; CUBIC BORON NITRIDE; ELECTRONS; ION BOMBARDMENT; IONS; LITHOGRAPHY; MAGNETRONS; MICROFLUIDICS; NITRIDES; PIGMENTS; REACTIVE SPUTTERING; SILICON; SOLIDS; SPUTTER DEPOSITION; TECHNOLOGY; THICK FILMS; THIN FILMS; TITANIUM NITRIDE; ZIRCONIUM;

ADVANCED TECHNOLOGIES; FUNCTIONAL MATERIALS; INTERNATIONAL CONFERENCES; KINETIC (POLYM.); REACTIVE MAGNETRON SPUTTERING (RMS); SILICON (111) SUBSTRATES;

MAGNETRON SPUTTERING;

EID: 45749120386     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/3-908451-50-7.133     Document Type: Conference Paper

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