The TiN/AlN multilayers deposited by filtered vacuum arc deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 382-385

  Zhang, Xu ^a   Wu, Xiangying ^a   Yi, Zhongzhen ^a   Zhang, Tonghe ^a   Zhang, Huixing ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

Filtered arc; Multilayer; Nanometer; Wear

Indexed keywords

ALUMINUM NITRIDE; CRYSTAL ORIENTATION; ELASTIC MODULI; TITANIUM NITRIDE; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

FILTERED VACUUM ARC DEPOSITION;

MULTILAYERS;

EID: 0037737706     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00767-5     Document Type: Conference Paper

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