Ordered arrays of epitaxial silicon nanowires produced by nanosphere lithography and chemical vapor deposition

Journal of Crystal Growth

Volumn 312, Issue 20, 2010, Pages 2887-2891

  Lerose, Damiana ^a,b   Bechelany, Mikhael ^c   Philippe, Laetitia ^c   Michler, Johann ^c   Christiansen, Silke ^b,d  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^c SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^d MAX PLANCK INSTITUTE FOR THE SCIENCE OF LIGHT   (Germany)

Author keywords

A1. Silicon nanowires; A2. Single crystal growth; A3. Chemical vapor deposition processes

Indexed keywords

A3. CHEMICAL VAPOR DEPOSITION PROCESSES; DEVICE APPLICATION; DIAMETER DISTRIBUTIONS; EPITAXIAL SILICON; GEOMETRICAL QUALITY; GOLD CATALYSTS; GOLD DOT; HIGH QUALITY; NANOSPHERE LITHOGRAPHY; ORDERED ARRAY; PATTERNING METHODS; REPRODUCIBILITIES; SI SUBSTRATES; SI WAFER; SILICON NANOWIRES; VAPOR LIQUID SOLIDS; WIRE LENGTH;

CATALYSTS; CRYSTALLIZATION; EPITAXIAL GROWTH; GOLD; GOLD COATINGS; GOLD DEPOSITS; NANOSPHERES; NANOWIRES; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON OXIDES; SILICON WAFERS; SINGLE CRYSTALS; WIRE;

CHEMICAL VAPOR DEPOSITION;

EID: 77956411498     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2010.07.023     Document Type: Article

References (33)

1. C. Thelander, P. Agarwal, S. Brongersma, J. Eymery, L.F. Feiner, A. Forchel, M. Scheffler, W. Riess, B.J. Ohlsson, U. Gsele, and L. Samuelson Nanowire-based onedimensional electronics Mater. Today 9 10 2006 28 35
2. M.C. McAlpine, H. Ahmad, D. Wang, and J.R. Heath Highly ordered nanowire arrays on plastic substrates for ultrasensitive exible chemical sensors Nat. Mater. 6 2007 379 384
3. Z. Gao, A. Agarwal, A.D. Trigg, N Singh, C. Fang, C.-H. Tung, Y. Fan, K.D. Buddharaju, and J. Kong Silicon nanowire arrays for label-free detection of DNA Anal. Chem. 79 2007 3291 3297
4. R.S. Wagner, and W.C. Ellis Vaporliquidsolid mechanism of single crystal growth Appl. Phys. Lett. 4 5 1964 89 90
5. D. Crouse, Y.-H. Lo, A.E. Miller, and M. Crouse Self-ordered pore structure of anodized aluminum on silicon and pattern transfer Appl. Phys. Lett. 76 1 2000 49 51
6. H.J. Fan, P. Werner, and M. Zacharias Semiconductor nanowires: from self-organization to patterned growth Small 2 6 2006 700 717
7. S. Sakamoto, L. Philippe, M. Bechelany, J. Michler, H. Asoh, and S. Ono Ordered hexagonal array of Au nanodots on Si substrate based on colloidal crystal templating Nanotechnology 19 2008 405304
8. M. Bechelany, P. Brodard, L. Philippe, and J. Michler Extended domains of organized nanorings of silver grains as surface-enhanced raman scattering sensors for molecular detection Nanotechnology 20 2009 455302
9. M. Bechelany, X. Maeder, J. Riesterer, J. Hankache, D. Lerose, S. Christiansen, J. Michler, and L. Philippe Sintering mechanisms of organized gold nanoparticles: influence of annealing temperature and atmosphere Crystal Growth Des. 10 2 2010 587 596
10. U.C. Fischer, and H.P. Zingsheim Submicroscopic pattern replication with visible light J. Vac. Sci. Technol. 19 4 1981 881 885
11. H.W. Deckmann, and J.H. Dunsmuir Natural lithography Appl. Phys. Lett. 41 4 1982 377 379
12. C.L. Haynes, and R.P.V. Duyne Nanosphere lithography: a versatile nanofabrication tool for studies of size-dependent nanoparticle optics J. Phys. Chem. B 105 2001 5599 5611
13. W. Mook, C. Niederberger, M. Bechelany, L. Philippe, and J. Michler Compression of free standing gold nanostructures: from stochastic yield to predictable flow Nanotechnology 21 2010 055701
14. K.H. Park, S. Lee, K.H. Koh, R. Lacerda, K.B.K. Teo, and W.I. Milne Advanced nanosphere lithography for the areal-density variation of periodic arrays of vertically aligned carbon nanofibers J. Appl. Phys. 97 2005 024311
15. J.N. Anker, W.P. Hall, O. Lyandres, N.C. Shah, J. Zhao, and R.P.V. Duyne Biosensing with plasmonic nanosensors Nat. Mater. 7 2008 442-453 2008
16. E.M. Hicks, O. Lyandres, W.P. Hall, S. Zou, M.R. Glucksberg, and R.P.V Duyne Plasmonic properties of anchored nanoparticles fabricated by reactive ion etching and nanosphere lithography J. Phys. Chem. C 111 2007 4116 4124
17. P. Nagpal, N.C. Lindquist, S.-H. Oh, and D.J. Norris Ultrasmooth patterned metals for plasmonics and metamaterials Science 325 2009 594 597
18. J. Elias, C. Lvy-Clment, M. Bechelany, J. Michler, Z. Wang, G.-Y. Wang, and L. Philippe Hollow urchin-like ZnO thin films by electrochemical deposition Adv. Mater. 22 2010 1604
19. A. Valsesia, T. Meziani, F. Bretagnol, P. Colpo, G. Ceccone, and F. Rossi Plasma assisted production of chemical nano-patterns by nano-sphere lithography: application to bio-interfaces J. Phys. D 40 2007 2341 2347
20. X. Zhang, E.M. Hicks, J. Zhao, G.C. Schatz, and R.P.V. Duyne Electrochemical tuning of silver nanoparticles fabricated by nanosphere lithography Nano Lett. 5 7 2005 1503 1507 (Pubitemid 41084443)
21. C.L. Cheung, R.J. Nikolic, C.E. Reinhardt, and T.F. Wang Fabrication of nanopillars by nanosphere lithography Nanotechnology 17 2006 1339 1343
22. C.-W. Kuo, J.-Y. Shiu, P. Chen, and G.A. Somorjai Fabrication of size-tunable large-area periodic silicon nanopillar arrays with sub-10 nm resolution J. Phys. Chem. B 107 2003 9950 9953
23. J.K.N. Lindner, D. Bahloul-Hourlier, D. Kraus, M. Weinl, T. Mlin, and B. Stritzker TEM characterization of Si nanowires grown by CVD on Si pre-structured by nanosphere lithography Mater. Sci. Semin. Proc. 11 2008 169
24. B.M. Kayes, J.M. Spurgeon, Th.C. Sadler, N.S. Lewis and H.A. Atwate, Synthesis and characterization of silicon nanorod arrays for solar cell applications, in: Proceedings of the IEEE Fourth World Conference on Photovoltaic Energy Conversion, 2006.
25. J.C. Hulteen, and R.P.V. Duyne Nanosphere lithography: a materials general fabrication process for periodic particle array surfaces J. Vac. Sci. Technol. A 13 3 1995 1553 1558
26. B. Fuhrmann, H.S. Leipner, H.-R. Hoeche, L. Schubert, P. Werner, and U. Goesele Ordered arrays of silicon nanowires produced by nanosphere lithography and molecular beam epitaxy Nano Lett. 5 12 2005 2524 2527
27. G. Yuan, H. Zhao, X. Liu, Z.S. Hasanali, Y. Zou, A. Levine, and D. Wang Synthesis and photoelectrochemical study of vertically aligned si nanowire arrays Angew. Chem. 121 51 2009 9860 9864
28. Th. Stelzner, G. Andrae, E. Wendler, W. Wesch, R. Scholz, U. Goesele, and S. Christiansen Growth of silicon nanowires by chemical vapour deposition on gold implanted silicon substrates Nanotechnology 17 2006 2895 2898 (Pubitemid 44149681)
29. A. Lugstein, M. Steinmair, Y.J. Hyun, G. Hauer, P. Pongratz, and E. Bertagnolli Pressure-induced orientation control of the growth of epitaxial silicon nanowires Nano Lett. 8 8 2008 2310 2314
30. V. Schmidt, S. Senz, and U. Gsele Diameter dependence of the growth velocity of silicon nanowires synthesized via the vapor-liquid-solid mechanism Phys. Rev. B 75 2007 045335
31. V. Schmidt, S. Senz, and U. Gsele The shape of epitaxially grown silicon nanowires and the influence of line tension Appl. Phys. A 80 2005 445 450
32. M. Preuss, and H.-J. Butt Measuring the contact angle of individual colloidal particles J. Colloid Interface Sci. 208 1998 468 477
33. V. Schmidt, S. Senz, and U. Gsele Diameter-dependent growth direction of epitaxial silicon nanowires Nano Lett. 5 5 2005 931 935