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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 5, 2010, Pages 1210-1214

Effect of process conditions on the microstructural formation of dc reactively sputter deposited AlN

(3) Ekpe, Samuel D a Jimenez, Francisco J a Dew, Steven K a

a UNIVERSITY OF ALBERTA (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALN; DC MAGNETRON SPUTTERING SYSTEMS; DEPOSITION PROCESS; DIFFERENT PROCESS; FIBROUS STRUCTURES; HIGH DEPOSITION RATES; MAGNETRON POWER; MICRO-STRUCTURAL; POROUS STRUCTURES; PROCESS CONDITION; PROCESS GAS; SUBSTRATE-TARGET DISTANCES; THIN FILM ALUMINUM; X-RAY DIFFRACTION DATA;

CRYSTAL ORIENTATION; DC POWER TRANSMISSION; DEPOSITION RATES; ENERGY DISPERSIVE SPECTROSCOPY; KINETIC ENERGY; MICROSTRUCTURE; NITRIDES; NITROGEN; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; X RAY DIFFRACTION;

ALUMINUM NITRIDE;

EID: 77956398251 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3478670 Document Type: Article

Times cited : (12)

References (13)

1
- 33344460663
- Structural, optical and mechanical properties of aluminium nitride films prepared by reactive DC magnetron sputtering
- DOI 10.1016/j.tsf.2005.07.281, PII S0040609005011454, Selected Papers from the 5th International Conference on Caotings on Glass (ICCG5)
- S. Venkataraj, D. Severin, R. Drese, F. Koerfer, and M. Wuttig, Thin Solid Films THSFAP 0040-6090 502, 235 (2006). 10.1016/j.tsf.2005.07.281 (Pubitemid 43290062)
- (2006) Thin Solid Films , vol.502 , Issue.1-2 , pp. 235-239
- Venkataraj, S.¹ Severin, D.² Drese, R.³ Koerfer, F.⁴ Wuttig, M.⁵

2
- 0033877880
- Cubic aluminum nitride and gallium nitride thin films prepared by pulsed laser deposition
- DOI 10.1016/S0169-4332(99)00372-4
- L. D. Wang and H. S. Kwok, Appl. Surf. Sci. ASUSEE 0169-4332 154-155, 439 (2000). 10.1016/S0169-4332(99)00372-4 (Pubitemid 30573137)
- (2000) Applied Surface Science , vol.154 , pp. 439-443
- Wang, L.D.¹ Kwok, H.S.²

3
- 0033534944
- THSFAP 0040-6090,. 10.1016/S0040-6090(98)01355-8
- Y. Kim, J. H. Kim, J. E. Park, B. J. Bae, B. Kim, J. T. Park, K. -S. Yu, and Y. Kim, Thin Solid Films THSFAP 0040-6090 339, 200 (1999). 10.1016/S0040-6090(98)01355-8
- (1999) Thin Solid Films , vol.339 , pp. 200
- Kim, Y.¹ Kim, J.H.² Park, J.E.³ Bae, B.J.⁴ Kim, B.⁵ Park, J.T.⁶ Yu, K.-S.⁷ Kim, Y.⁸

4
- 0032483874
- THSFAP 0040-6090,. 10.1016/S0040-6090(98)01133-X
- G. Y. Meng, S. Xie, and D. K. Peng, Thin Solid Films THSFAP 0040-6090 334, 145 (1998). 10.1016/S0040-6090(98)01133-X
- (1998) Thin Solid Films , vol.334 , pp. 145
- Meng, G.Y.¹ Xie, S.² Peng, D.K.³

5
- 0037461188
- The evolution of preferred orientation and morphology of AlN films under various RF sputtering powers
- DOI 10.1016/S0257-8972(02)00923-4
- H. Cheng and P. Hing, Surf. Coat. Technol. SCTEEJ 0257-8972 167, 297 (2003). 10.1016/S0257-8972(02)00923-4 (Pubitemid 36400617)
- (2003) Surface and Coatings Technology , vol.167 , Issue.2-3 , pp. 297-301
- Cheng, H.¹ Hing, P.²

6
- 0035302233
- JAPNDE 0021-4922,. 10.1143/JJAP.40.2413
- M. Ishihara, K. Yamamoto, F. Kokai, and Y. Koga, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 40, 2413 (2001). 10.1143/JJAP.40.2413
- (2001) Jpn. J. Appl. Phys., Part 1 , vol.40 , pp. 2413
- Ishihara, M.¹ Yamamoto, K.² Kokai, F.³ Koga, Y.⁴

7
- 10844236303
- THSFAP 0040-6090,. 10.1016/j.tsf.2004.09.007
- S. D. Ekpe, L. W. Bezuidenhout, and S. K. Dew, Thin Solid Films THSFAP 0040-6090 474, 330 (2005). 10.1016/j.tsf.2004.09.007
- (2005) Thin Solid Films , vol.474 , pp. 330
- Ekpe, S.D.¹ Bezuidenhout, L.W.² Dew, S.K.³

8
- 85072871154
- in, edited by D. Depla and S. Mahieu (Springer, New York), Vol.,. 10.1007/978-3-540-76664-3-4
- S. Berg, T. Nyberg, and T. Kubart, in Reactive Sputter Deposition, edited by, D. Depla, and, S. Mahieu, (Springer, New York, 2008), Vol. 109, p. 131. 10.1007/978-3-540-76664-3-4
- (2008) Reactive Sputter Deposition , vol.109 , pp. 131
- Berg, S.¹ Nyberg, T.² Kubart, T.³

9
- 84950555774
- JVTAD6 0734-2101,. 10.1116/1.574988
- S. M. Rossnagel, J. Vac. Sci. Technol. A JVTAD6 0734-2101 6, 19 (1988). 10.1116/1.574988
- (1988) J. Vac. Sci. Technol. A , vol.6 , pp. 19
- Rossnagel, S.M.¹

10
- 33645062416
- JPAPBE 0022-3727,. 10.1088/0022-3727/39/7/012
- S. D. Ekpe and S. K. Dew, J. Phys. D JPAPBE 0022-3727 39, 1413 (2006). 10.1088/0022-3727/39/7/012
- (2006) J. Phys. D , vol.39 , pp. 1413
- Ekpe, S.D.¹ Dew, S.K.²

11
- 0000807120
- JVTAD6 0734-2101,. 10.1116/1.572994
- D. W. Hoffman, J. Vac. Sci. Technol. A JVTAD6 0734-2101 3, 561 (1985). 10.1116/1.572994
- (1985) J. Vac. Sci. Technol. A , vol.3 , pp. 561
- Hoffman, D.W.¹

12
- 33745498762
- Inhomogeneous rarefaction of the process gas in a direct current magnetron sputtering system
- DOI 10.1116/1.2210005, 133604JVA
- F. Jimenez, S. D. Ekpe, and S. K. Dew, J. Vac. Sci. Technol. A JVTAD6 0734-2101 24, 1530 (2006). 10.1116/1.2210005 (Pubitemid 43959199)
- (2006) Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol.24 , Issue.4 , pp. 1530-1534
- Jimenez, F.¹ Ekpe, S.D.² Dew, S.K.³

13
- 85072851005
- in, edited by D. Depla and S. Mahieu (Springer, New York), Vol.,. 10.1007/978-3-540-76664-3-5
- D. Depla, S. Mahieu, and R. De Gryse, in Reactive Sputter Deposition, edited by, D. Depla, and, S. Mahieu, (Springer, New York, 2008), Vol. 109, p. 153. 10.1007/978-3-540-76664-3-5
- (2008) Reactive Sputter Deposition , vol.109 , pp. 153
- Depla, D.¹ Mahieu, S.² De Gryse, R.³

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