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Volumn 108, Issue 4, 2010, Pages

Depth analysis of boron diffusion in MgO/CoFeB bilayer by x-ray photoelectron spectroscopy

(12) Lu, Y a,c Lepine B b Jezequel G b Ababou, S b Alnot, M c Lambert, J d Renard, A d Mullet, M d,e Deranlot, C a Jaffres H a Petroff, F a George, J M a

a CNRS (France)

b UNIVERSITÉ PARIS SACLAY (France)

c UNIVERSITÉ DE RENNES 1 (France)

d INSTITUT JEAN LAMOUR (France)

e Laboratoire de Chimie Physique et Microbiologie pour l'Environnement (France)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; COBALT COMPOUNDS; DIFFUSION BARRIERS; DIFFUSION IN SOLIDS; IRON COMPOUNDS; MAGNESIA; PHOTOELECTRONS; PHOTONS; RUTHENIUM COMPOUNDS;

B DIFFUSION; BI-LAYER; BORON ATOM; BORON DIFFUSIONS; CRYSTALLIZATION PROCESS; DEPTH ANALYSIS; MGO BARRIER;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77956336978 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3465308 Document Type: Conference Paper

Times cited : (28)

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