Study of the refractive index change in a-Si:H thin films patterned by 532 nm laser radiation for photovoltaic applications

Thin Solid Films

Volumn 518, Issue 18, 2010, Pages 5331-5339

  Colina, M ^a   Molpeceres, C ^a   Holgado, M ^a   Gandia, J ^b   Nos, O ^c   Ocana J L ^a  

^a UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

^b CIEMAT   (Spain)

^c UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Hydrogenated amorphous silicon; IR VIS spectroscopy; Laser scribing; Raman spectroscopy; Solar cells; Thin films

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; HYDROGENATION; LASER ABLATION; PHOTOVOLTAIC CELLS; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; SOLAR CELLS; THIN FILMS;

FABRICATION OF THIN FILMS; FOURIER TRANSFORM SPECTROMETRY; HYDROGENATED AMORPHOUS SILICON (A-SI:H); LASER SCRIBING; PHOTOVOLTAIC APPLICATIONS; REFRACTIVE INDEX VARIATIONS; THERMO-MECHANICAL EFFECTS; VIS SPECTROSCOPY;

AMORPHOUS SILICON;

EID: 77955662800     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.04.016     Document Type: Article

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