Characterization of titanium nitride (TiN) films on various substrates using spectrophotometry, beam profile reflectometry, beam profile ellipsometry and spectroscopic beam profile ellipsometry

Thin Solid Films

Volumn 313-314, Issue , 1998, Pages 308-313

  Leng, J M ^a   Chen, J ^a   Fanton, J ^a   Senko, M ^a   Ritz, K ^a   Opsal, J ^a  

^a Therma Wave Inc   (United States)

Author keywords

Beam profile ellipsometry; Beam profile reflectometry; Spectrometry; Spectroscopic beam profile ellipsometry; Titanium nitride

Indexed keywords

ELLIPSOMETRY; GRAIN BOUNDARIES; REFLECTOMETERS; SPECTROPHOTOMETRY; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

BEAM PROFILE ELLIPSOMETRY (BPE); BEAM PROFILE REFLECTOMETRY (BPR);

SEMICONDUCTING FILMS;

EID: 0031998527     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00838-9     Document Type: Article

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