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Volumn 491, Issue 1-2, 2005, Pages 212-216
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Microstructure properties of nanocrystalline silicon/SiO2 multilayers fabricated by laser-induced crystallization
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Author keywords
Constrained crystallization; Multilayers; Nanocrystalline Si; Pulsed laser
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Indexed keywords
AMORPHOUS MATERIALS;
ATOMIC FORCE MICROSCOPY;
CRYSTALLIZATION;
ELECTRON DIFFRACTION;
HYDROGENATION;
MICROSTRUCTURE;
NANOSTRUCTURED MATERIALS;
RAMAN SCATTERING;
SCANNING ELECTRON MICROSCOPY;
SILICA;
SILICON;
X RAY DIFFRACTION ANALYSIS;
CONSTRAINED CRYSTALIZATION;
NANOCRYSTALLINE SI;
PLASMA OXIDATION;
PULSED LASER;
MULTILAYERS;
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EID: 25144457521
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2005.05.031 Document Type: Article |
Times cited : (7)
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References (12)
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