In situ micro Raman investigation of the laser crystallization in Si thin films plasma enhanced chemical vapor deposition-grown from He-diluted SiH 4

Journal of Applied Physics

Volumn 95, Issue 10, 2004, Pages 5366-5372

  Santato, Clara ^a   Mattei, Giorgio ^a   Ruihua, Wu ^b   Mecarini, Federico ^b  

^a CNR IMIP   (Italy)

^b IFN CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CONTINUOUS WAVE LASERS; CRYSTALLIZATION; DEHYDROGENATION; LOW TEMPERATURE OPERATIONS; MICROMETERS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

LASER CRYSTALLIZATION; LASER POWER DENSITIES (LPD); LASER TREATMENT;

THIN FILMS;

EID: 2942551081     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1699506     Document Type: Article

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