Numerical and experimental analysis on green laser crystallization of amorphous silicon thin films

Optics and Laser Technology

Volumn 41, Issue 4, 2009, Pages 380-383

  Yuan, Zhijun ^a   Lou, Qihong ^a   Zhou, Jun ^a   Dong, Jingxing ^a   Wei, Yunrong ^a   Wang, Zhijiang ^a   Zhao, Hongming ^a   Wu, Guohua ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

Finite difference simulation; Laser crystallization; Polycrystalline silicon; Thin film

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; CRYSTALLIZATION; LASERS; NANOCRYSTALLINE ALLOYS; NEODYMIUM LASERS; NONMETALS; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS; POLYSILICON; SEMICONDUCTING SILICON COMPOUNDS; SOLIDS; THIN FILM DEVICES; THIN FILMS;

AMORPHOUS SILICON THIN FILMS; EXPERIMENTAL ANALYSIS; EXPERIMENTAL DATUM; FINITE DIFFERENCE SIMULATION; FLUENCE; FLUENCES; GREEN LASERS; LASER CRYSTALLIZATION; LASER FLUENCE; MELT DEPTHS; MELTING THRESHOLDS; ND : YAG LASERS; NUMERICAL MODELS; POLYCRYSTALLINE SILICON; RAMAN SPECTRUM; THIN FILM;

AMORPHOUS SILICON;

EID: 59849096267     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2008.09.003     Document Type: Article

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