Transparent, amorphous and organics-free ZnO thin films produced by chemical solution deposition at 150 °c

Thin Solid Films

Volumn 518, Issue 18, 2010, Pages 5134-5139

  Tellier, J ^a   Kuscer D ^a   Malic B ^a   Cilensek J ^a   Skarabot M ^a   Kovac J ^a   Goncalves G ^b   Musevic I ^a   Kosec, M ^a  

^a JO EF STEFAN INSTITUTE   (Slovenia)

^b Center of Excellence in Microelectronics Optoelectronics and Processes   (Portugal)

Author keywords

Amorphous materials; Chemical solution deposition; Resistivity; Thin film transistor; Transparent electronics; Zinc oxide

Indexed keywords

2-METHOXYETHANOL; CHEMICAL SOLUTION DEPOSITION; LOW TEMPERATURE PROCESSING; MICRO-STRUCTURAL; ORGANIC RESIDUES; ORGANICS; POLYMER SUBSTRATE; RANDOMLY ORIENTED GRAINS; RESISTIVITY; ROOT MEAN SQUARE ROUGHNESS; SODA LIME GLASS; STABLE PRECURSORS; TRANSPARENT ELECTRONICS; VISIBLE RANGE; ZINC ACETATE DIHYDRATE; ZNO; ZNO FILMS; ZNO THIN FILM;

CHEMICALS; DEPOSITION; METALLIC FILMS; SILICON; SILICON COMPOUNDS; THIN FILM TRANSISTORS; THIN FILMS; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

AMORPHOUS FILMS;

EID: 77955653142     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.010     Document Type: Article

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