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Volumn 198, Issue , 2007, Pages 421-426
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Characteristics of ITO films deposited by dc magnetron sputtering using various sintered indium-tin-oxide targets
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC PROPERTIES;
EROSION;
GLASS;
INDIUM;
JOINING;
LIQUID METALS;
MAGNETRON SPUTTERING;
MAGNETRONS;
METALLIC GLASS;
OXIDE FILMS;
OXYGEN;
POLYMER BLENDS;
PORE SIZE;
POROSITY;
QUALITY CONTROL;
SOIL MECHANICS;
SUBSTRATES;
TIN;
TITANIUM COMPOUNDS;
COOLING EFFICIENCIES;
DC MAGNETRON SPUTTERING;
DC POWERS;
ELECTRICAL PROPERTIES;
FILM PROPERTIES;
GLASS SUBSTRATES;
HIGH CONDUCTIVITIES;
HIGH DENSITIES;
HIGH STABILITIES;
INDIUM TIN OXIDE FILMS;
INDIUM TIN OXIDES;
ITO FILMS;
OXYGEN FLOW RATIOS;
SPUTTERING TIMES;
SUBSTRATE TEMPERATURES;
TARGET EROSIONS;
TARGET SURFACES;
TOTAL GAS PRESSURES;
TARGETS;
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EID: 57649238409
PISSN: 10421122
EISSN: None
Source Type: Book Series
DOI: None Document Type: Conference Paper |
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Times cited : (2)
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References (12)
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