The effect of oxide overlayers on secondary electron dopant mapping

Microscopy and Microanalysis

Volumn 15, Issue 3, 2009, Pages 237-243

  Dapor, Maurizio ^a   Jepson, Mark A E ^b   Inkson, Beverley J ^b   Rodenburg, Cornelia ^b  

^a FONDAZIONE BRUNO KESSLER   (Italy)

^b UNIVERSITY OF SHEFFIELD   (United Kingdom)

Author keywords

Dopant profiling; Electron microscopy; Monte Carlo modeling; Semiconductors; Silicon

Indexed keywords

EID: 69849106238     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927609090400     Document Type: Article

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