SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 87, Issue 11, 2010, Pages 2077-2080

Fabrication of sub-micron high aspect ratio diamond structures with nanoimprint lithography

(4) Karlsson, M a Vartianen, I b Kuittinen, M b Nikolajeff, F a

a UPPSALA UNIVERSITY (Sweden)

b UNIVERSITY OF EASTERN FINLAND (Finland)

Author keywords

CVD diamond; Inductively coupled plasma etching; Nanoimprint lithography; Nanostructures

Indexed keywords

CVD DIAMOND; DIAMOND STRUCTURES; DIAMOND SUBSTRATES; FILL FACTOR; HIGH ASPECT RATIO; OPTICAL QUALITIES; POLYCRYSTALLINE DIAMONDS; RESIST STRUCTURES; SUBMICRON;

ASPECT RATIO; CHEMICAL VAPOR DEPOSITION; DIAMONDS; ELECTROMAGNETIC INDUCTION; FABRICATION; INDUCTIVELY COUPLED PLASMA; NANOSTRUCTURES; PLASMA ETCHING; PRESSURE DROP;

NANOIMPRINT LITHOGRAPHY;

EID: 77955511642 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2009.12.085 Document Type: Article

Times cited : (9)

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