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Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

Size dependence of quick cavity filling behavior in ultraviolet nanoimprint lithography using pentafluoropropane gas

(4) Youn, Sung Won a,b Hiroshima, Hiroshi a,b Takahashi, Masaharu a Maeda, Ryutaro a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYSIS MODELS; CAVITY FILLING; CAVITY SIZE; CAVITY WIDTH; HFC-245FA; LINEAR RELATIONSHIPS; NANOPATTERNING; PENTAFLUOROPROPANE; REAL-TIME MONITORING SYSTEMS; RESIST THICKNESS; SHRINKAGE BEHAVIOR; SIZE DEPENDENCE; STEFAN'S EQUATION; ULTRA HIGH SPEED; ULTRAVIOLET-NANOIMPRINT LITHOGRAPHY;

CAVITY RESONATORS; ELECTRON BEAM LITHOGRAPHY; FILLING; NONLINEAR EQUATIONS; SHRINKAGE;

NANOIMPRINT LITHOGRAPHY;

EID: 77955330645 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.49.06GL06 Document Type: Article

Times cited : (15)

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