Numerical study on bubble trapping in UV-nanoimprint lithography

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 684-687

  Morihara, Daisuke ^a   Hiroshima, Hiroshi ^b   Hirai, Yoshihiko ^a  

^a Osaka Prefecture University   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Bubble; Contact angle; Polymer; Resist; Template; UV nanoimprint; Viscos flow

Indexed keywords

BUBBLE; RESIST; TEMPLATE; UV-NANOIMPRINT; VISCOS FLOW;

CONTACT ANGLE; VISCOSITY OF LIQUIDS;

NANOIMPRINT LITHOGRAPHY;

EID: 67349255339     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.005     Document Type: Article

References (5)

1. Reddy S., and Bonnecaze R.T. Microelectronic Eng. 82 (2005) 60
2. Reddy S., Schunk P.R., and Bonnecaze R.T. Phys. Fluids 17 (2005) 122104
3. K. Kim, J. Jeong, D. Choi, E. Lee, A. Altun, Abst. of Material Research Society 2007 Fall Meeting (Boston, 2007) KK10.53.
4. Hiroshima H., and Komuro M. Jpn. J. Appl. Phys. 46 (2007) 6391
5. http://www.mizuho-ir.co.jp/science/alfaflow/index.html (in Japanese).