Reactive magnetron sputtering of indium tin oxide films on acrylics - morphology and bonding state

Thin Solid Films

Volumn 370, Issue 1, 2000, Pages 33-37

  Huang, Jow Lay ^a   Jah, Yin Tsan ^a   Yau, Bao Shun ^a   Chen, Ching Yun ^a   Lu, Horng Hwa ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; ATOMIC FORCE MICROSCOPY; BONDING; CRYSTAL MICROSTRUCTURE; ELECTRIC POTENTIAL; GRAIN SIZE AND SHAPE; LOW TEMPERATURE OPERATIONS; MAGNETRON SPUTTERING; MORPHOLOGY; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

INDIUM TIN OXIDE; OXYGEN FLOW; REACTIVE MAGNETRON SPUTTERING;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0033723412     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00938-X     Document Type: Article

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