Radial-profile control of cylindrical plasma source with multiple low-inductance antenna units

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Takenaka, Kosuke ^a,b   Setsuhara, Yuichi ^a,b   Nishisaka, Kazuaki ^c   Ebe, Akinori ^c  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c EMD Corporation   (Japan)

Author keywords

Inductively coupled plasma; Internal antenna; Largearea plasma source; Radial profile control

Indexed keywords

CONTROL CAPABILITIES; CYLINDRICAL CHAMBERS; CYLINDRICAL PLASMAS; DEPOSITION PROFILES; INTERNAL ANTENNAS; ION SATURATION CURRENT; LARGE-AREA PLASMA; LARGE-AREA WAFERS; LOW-INDUCTANCE ANTENNA; NONUNIFORMITY; PLASMA CONTROL; PROFILE CONTROL; RADIAL DISTRIBUTIONS; RADIAL-PROFILE CONTROL;

INDUCTANCE; INDUCTIVELY COUPLED PLASMA; PLASMA CONFINEMENT; PLASMA SOURCES;

ANTENNAS;

EID: 77954898616     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200930609     Document Type: Conference Paper

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