Resistivity of thin Cu films coated with Ta, Ti, Ru, Al, and Pd barrier layers from first principles

Physical Review B - Condensed Matter and Materials Physics

Volumn 81, Issue 4, 2010, Pages

  Zahid, Ferdows ^a   Ke, Youqi ^a   Gall, Daniel ^b   Guo, Hong ^a  

^a MCGILL UNIVERSITY   (Canada)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 77954830121     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.81.045406     Document Type: Article

References (34)

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