Thickness dependent electrical resistivity of ultrathin (<40 nm) Cu films

Thin Solid Films

Volumn 384, Issue 1, 2001, Pages 151-156

  Liu, H D ^a   Zhao, Y P ^a   Ramanath, G ^a   Murarka, S P ^a   Wang, G C ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY; EVAPORATION; SILICON; SUBSTRATES; SURFACE ROUGHNESS; ULTRATHIN FILMS;

ULTRA HIGH VACUUM (UHV) CHAMBERS;

METALLIC FILMS;

EID: 0035281728     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01818-6     Document Type: Article

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