SCOPUS 정보 검색 플랫폼

Volumn 312, Issue 15, 2010, Pages 2179-2184

Growth of low defect density GaP layers on Si substrates within the critical thickness by optimized shutter sequence and post-growth annealing

(5) Yamane, Keisuke a Kawai, Tsuyoshi a Furukawa, Yuzo a Okada, Hiroshi a Wakahara, Akihiro a

a TOYOHASHI UNIVERSITY OF TECHNOLOGY (Japan)

Author keywords

A1. Defects; A1. Growth models; A1. Surfaces; A3. Migration enhanced epitaxy; A3. Molecular beam epitaxy; B2. Semiconducting gallium compounds

Indexed keywords

A1. GROWTH MODELS; A3. MIGRATION ENHANCED EPITAXY; A3. MOLECULAR BEAM EPITAXY; B2. SEMICONDUCTING GALLIUM COMPOUNDS; GROWTH MODELS; MIGRATION ENHANCED EPITAXY;

ANNEALING; DEFECT DENSITY; DEFECTS; EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MONOLAYERS; OPTIMIZATION; SEMICONDUCTING GALLIUM; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTOR GROWTH; STACKING FAULTS; SUBSTRATES; SURFACE ROUGHNESS;

GALLIUM ALLOYS;

EID: 77954472933 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2010.04.038 Document Type: Article

Times cited : (43)

References (38)

1
- 0027147132
- I. Hayashi Jpn. J. Appl. Phys. 32 1993 L266
- (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 266
- Hayashi, I.¹

2
- 56249119153
- H. Yonezu, Y. Furukawa, and A. Wakahara J. Cryst. Growth 310 2008 4757
- (2008) J. Cryst. Growth , vol.310 , pp. 4757
- Yonezu, H.¹ Furukawa, Y.² Wakahara, A.³

3
- 0035905249
- K. Momose, H. Yonezu, Y. Fujimoto, and Y. Furukawa Appl. Phys. Lett. 79 2001 4151
- (2001) Appl. Phys. Lett. , vol.79 , pp. 4151
- Momose, K.¹ Yonezu, H.² Fujimoto, Y.³ Furukawa, Y.⁴

4
- 63349089351
- K. Umeno, Y. Furukawa, A Wakahara, R. Noma, H. Okada, H. Yonezu, Y. Takagi, and H. Kan J. Cryst. Growth 311 2009 1748
- (2009) J. Cryst. Growth , vol.311 , pp. 1748
- Umeno, K.¹ Furukawa, Y.² Wakahara, A.³ Noma, R.⁴ Okada, H.⁵ Yonezu, H.⁶ Takagi, Y.⁷ Kan, H.⁸

5
- 0036478572
- Y. Furukawa, H. Yonezu, K. Ojima, K. Samonji, Y. Fujimoto, K. Momose, and K. Aiki Jpn. J. Appl. Phys. 41 2002 L528
- (2002) Jpn. J. Appl. Phys. , vol.41 , pp. 528
- Furukawa, Y.¹ Yonezu, H.² Ojima, K.³ Samonji, K.⁴ Fujimoto, Y.⁵ Momose, K.⁶ Aiki, K.⁷

6
- 0022669935
- H. Kroemer J. Cryst. Growth 81 1987 193
- (1987) J. Cryst. Growth , vol.81 , pp. 193
- Kroemer, H.¹

7
- 0000832630
- P.M. Petroff J. Vac. Sci. Technol. B 4 1986 874
- (1986) J. Vac. Sci. Technol. B , vol.4 , pp. 874
- Petroff, P.M.¹

8
- 0021521599
- M. Akiyama, Y. Kawarada, and K. Kaminishi Jpn. J. Appl. Phys. 23 1984 L843
- (1984) Jpn. J. Appl. Phys. , vol.23 , pp. 843
- Akiyama, M.¹ Kawarada, Y.² Kaminishi, K.³

9
- 59649093444
- Y. Takano, K. Morizumi, S. Watanabe, H. Masuda, T. Okamoto, K. Noda, S. Fukuda, T. Ozeki, K. Kuwahara, S. Fuke, Y. Furukawa, and H. Yonezu Jpn. J. Appl. Phys. 48 2009 011102
- (2009) Jpn. J. Appl. Phys. , vol.48 , pp. 011102
- Takano, Y.¹ Morizumi, K.² Watanabe, S.³ Masuda, H.⁴ Okamoto, T.⁵ Noda, K.⁶ Fukuda, S.⁷ Ozeki, T.⁸ Kuwahara, K.⁹ Fuke, S.¹⁰ Furukawa, Y.¹¹ Yonezu, H.¹²

10
- 37849185779
- G. Brammertz, Y. Mols, S. Degroote, M. Leys, J.V. Steenbergen, G. Borghs, and M. Caymax J. Cryst. Growth 297 2006 204
- (2006) J. Cryst. Growth , vol.297 , pp. 204
- Brammertz, G.¹ Mols, Y.² Degroote, S.³ Leys, M.⁴ Steenbergen, J.V.⁵ Borghs, G.⁶ Caymax, M.⁷

11
- 0010555956
- M. Bafleur, A. Munoz-Yague, and A. Rocher J. Cryst. Growth 59 1982 531
- (1982) J. Cryst. Growth , vol.59 , pp. 531
- Bafleur, M.¹ Munoz-Yague, A.² Rocher, A.³

12
- 0018007058
- W. Hagen, and H. Strunk Appl. Phys. 17 1978 85
- (1978) Appl. Phys. , vol.17 , pp. 85
- Hagen, W.¹ Strunk, H.²

13
- 21544433387
- M. Yamaguchi, T. Nishioka, and M. Sugo Appl. Phys. Lett. 54 1989 24
- (1989) Appl. Phys. Lett. , vol.54 , pp. 24
- Yamaguchi, M.¹ Nishioka, T.² Sugo, M.³

14
- 5244348384
- M. Yamaguchi, M. Tachikawa, Y. Itoh, M. Sugo, and S. Kondo J. Appl. Phys. 68 1990 4518
- (1990) J. Appl. Phys. , vol.68 , pp. 4518
- Yamaguchi, M.¹ Tachikawa, M.² Itoh, Y.³ Sugo, M.⁴ Kondo, S.⁵

15
- 0032473772
- Y. Takagi, H. Yonezu, K. Samonji, T. Tsuji, and N. Oshima J. Cryst. Growth 187 1998 42
- (1998) J. Cryst. Growth , vol.187 , pp. 42
- Takagi, Y.¹ Yonezu, H.² Samonji, K.³ Tsuji, T.⁴ Oshima, N.⁵

16
- 59749087381
- K. Yamane, T. Kobayashi, Y. Furukawa, H. Okada, H. Yonezu, and A. Wakahara J. Cryst. Growth 311 2009 794
- (2009) J. Cryst. Growth , vol.311 , pp. 794
- Yamane, K.¹ Kobayashi, T.² Furukawa, Y.³ Okada, H.⁴ Yonezu, H.⁵ Wakahara, A.⁶

17
- 67649136098
- T. Grassman, M.R. Brenner, S. Rajagopalan, R. Unocic, R. Dehoff, M. Mills, H. Fraser, and S.A. Ringel Appl. Phys. Lett. 94 2009 232106
- (2009) Appl. Phys. Lett. , vol.94 , pp. 232106
- Grassman, T.¹ Brenner, M.R.² Rajagopalan, S.³ Unocic, R.⁴ Dehoff, R.⁵ Mills, M.⁶ Fraser, H.⁷ Ringel, S.A.⁸

18
- 41449091481
- I. Nmeth, B. Kunert, W. Stolz, and K. Volz J. Cryst. Growth 310 2008 1595
- (2008) J. Cryst. Growth , vol.310 , pp. 1595
- Nmeth, I.¹ Kunert, B.² Stolz, W.³ Volz, K.⁴

19
- 0002391763
- J.M. Olson, M.M. Al-Jassim, A. Kibbler, and K.M. Jones J. Cryst. Growth 77 1986 515
- (1986) J. Cryst. Growth , vol.77 , pp. 515
- Olson, J.M.¹ Al-Jassim, M.M.² Kibbler, A.³ Jones, K.M.⁴

20
- 0000820409
- M. Tachikawa, and H. Mori Appl. Phys. Lett. 56 1990 2225
- (1990) Appl. Phys. Lett. , vol.56 , pp. 2225
- Tachikawa, M.¹ Mori, H.²

21
- 0030563408
- T. Soga, T. Jimbo, and M. Umeno J. Cryst. Growth 163 1996 165
- (1996) J. Cryst. Growth , vol.163 , pp. 165
- Soga, T.¹ Jimbo, T.² Umeno, M.³

22
- 33847248853
- Y. Furukawa, H. Yonezu, A. Wakahara, S. Ishizi, S.Y. Moon, and Y. Morisaki J. Cryst. Growth 300 2007 172
- (2007) J. Cryst. Growth , vol.300 , pp. 172
- Furukawa, Y.¹ Yonezu, H.² Wakahara, A.³ Ishizi, S.⁴ Moon, S.Y.⁵ Morisaki, Y.⁶

23
- 0022699183
- A. Ishizaka, and Y. Shiraki J. Electrochem. Soc. 133 1986 666
- (1986) J. Electrochem. Soc. , vol.133 , pp. 666
- Ishizaka, A.¹ Shiraki, Y.²

24
- 77955267602
- F.K-. Kuhnenfeld Inst. Phys. Conf. Ser. 33a 1997 158
- (1997) Inst. Phys. Conf. Ser. , vol.33 , pp. 158
- Kuhnenfeld, F.K.¹

25
- 59749091560
- T.S. Kuan, and C.-A. Chang J. Appl. Phys. 54 1983 8
- (1983) J. Appl. Phys. , vol.54 , pp. 8
- Kuan, T.S.¹ Chang, C.-A.²

26
- 56249115168
- I. Nmeth, B. Kunert, W. Stolz, and K. Volz J. Cryst. Growth 310 2008 4763
- (2008) J. Cryst. Growth , vol.310 , pp. 4763
- Nmeth, I.¹ Kunert, B.² Stolz, W.³ Volz, K.⁴

27
- 0035276876
- O. Pulchi, W.G. Schmidt, and F. Bechstedt Phys. Status Solidi A 184 2001 105
- (2001) Phys. Status Solidi A , vol.184 , pp. 105
- Pulchi, O.¹ Schmidt, W.G.² Bechstedt, F.³

28
- 0034301330
- W.G. Schmidt, J. Bernholc, and F. Bechstedt Appl. Surf. Sci. 166 2000 179
- (2000) Appl. Surf. Sci. , vol.166 , pp. 179
- Schmidt, W.G.¹ Bernholc, J.² Bechstedt, F.³

29
- 0000920662
- Y. Wang, X. Chen, and R.J. Hamers Phys. Rev. B 50 1994 4534
- (1994) Phys. Rev. B , vol.50 , pp. 4534
- Wang, Y.¹ Chen, X.² Hamers, R.J.³

30
- 0026929524
- Sam-Dong Kim, and J.S. Harris Jr J. Cryst. Growth 123 1992 439
- (1992) J. Cryst. Growth , vol.123 , pp. 439
- Kim, S.-D.¹ Harris Jr., J.S.²

31
- 0033323444
- V. Narayanan, N. Sukidi, K.J. Bachmann, and S. Mahajan Thin Solid Films 357 1999 53
- (1999) Thin Solid Films , vol.357 , pp. 53
- Narayanan, V.¹ Sukidi, N.² Bachmann, K.J.³ Mahajan, S.⁴

32
- 36749115038
- Y. Hayafuji, and S. Kawado J. Appl. Phys. 53 1982 1215
- (1982) J. Appl. Phys. , vol.53 , pp. 1215
- Hayafuji, Y.¹ Kawado, S.²

33
- 0008883364
- F. Bozso, and Ph. Avouris Phys. Rev. B 43 1991 1847
- (1991) Phys. Rev. B , vol.43 , pp. 1847
- Bozso, F.¹ Avouris, Ph.²

34
- 0000535022
- M.L. Tu, and B.S. Meyerson J. Vac. Sci. Technol. A 2 1984 446
- (1984) J. Vac. Sci. Technol. A , vol.2 , pp. 446
- Tu, M.L.¹ Meyerson, B.S.²

35
- 33645043702
- H. Maruyama, K. Pak, K. Sakakibara, and H. Yonezu Appl. Phys. Lett. 63 1993 2375
- (1993) Appl. Phys. Lett. , vol.63 , pp. 2375
- Maruyama, H.¹ Pak, K.² Sakakibara, K.³ Yonezu, H.⁴

36
- 0000122127
- T. Ohno, and K. Shiraishi Phys. Rev. B 42 1990 11194
- (1990) Phys. Rev. B , vol.42 , pp. 11194
- Ohno, T.¹ Shiraishi, K.²

37
- 0000936568
- T. Kawai, H. Yonezu, D. Saito, M. Yokozeki, and K. Park Jpn. J. Appl. Phys. 33 1994 L1740
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 1740
- Kawai, T.¹ Yonezu, H.² Saito, D.³ Yokozeki, M.⁴ Park, K.⁵

38
- 0040516114
- H.L. Thai, and Y.C. Kao J. Appl. Phys. 67 1990 2862
- (1990) J. Appl. Phys. , vol.67 , pp. 2862
- Thai, H.L.¹ Kao, Y.C.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.