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Volumn 54, Issue 12, 2007, Pages 863-872

Development of highly-functional ceramic materials by chemical vapor deposition

Author keywords

Functional ceramics; High deposition rate; Laser CVD; Plasma CVD; Thermal CVD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DETERIORATION; THICK FILMS; TITANIUM COMPOUNDS; YTTRIA STABILIZED ZIRCONIA;

EID: 39749116395     PISSN: 05328799     EISSN: None     Source Type: Journal    
DOI: 10.2497/jjspm.54.863     Document Type: Article
Times cited : (5)

References (22)
  • 2
    • 0020849772 scopus 로고
    • Preparation of silicon carbide by chemical vapor deposition
    • T.Hirai, K.Niihara and T.Goto: "Preparation of silicon carbide by chemical vapor deposition", J. Ceram. Soc. Jpn., 91 (1983) 502-509.
    • (1983) J. Ceram. Soc. Jpn , vol.91 , pp. 502-509
    • Hirai, T.1    Niihara, K.2    Goto, T.3
  • 4
    • 0031249110 scopus 로고    scopus 로고
    • High-temperature oxidation of silicon carbide and silicon nitride
    • T.Narushima, T.Goto, T.Hirai and Y.Iguchi: "High-temperature oxidation of silicon carbide and silicon nitride", Mater. Trans., JIM, 38(1997)821-835.
    • (1997) Mater. Trans., JIM , vol.38 , pp. 821-835
    • Narushima, T.1    Goto, T.2    Hirai, T.3    Iguchi, Y.4
  • 5
    • 0016940203 scopus 로고
    • Chemical vapour-deposited silicon nitride, Part 1. Preparation and some properties
    • K.Niihara and T.Hirai: "Chemical vapour-deposited silicon nitride, Part 1. Preparation and some properties", J. Mater. Sci., 11(1976)593-603.
    • (1976) J. Mater. Sci , vol.11 , pp. 593-603
    • Niihara, K.1    Hirai, T.2
  • 6
    • 0024716359 scopus 로고
    • High-temperature passive oxidation of chemically vapor deposited silicon carbide
    • H.Narushima, T.Goto and T.Hirai: "High-temperature passive oxidation of chemically vapor deposited silicon carbide", J. Amer. Ceram. Soc., 72(1989)1386-1390.
    • (1989) J. Amer. Ceram. Soc , vol.72 , pp. 1386-1390
    • Narushima, H.1    Goto, T.2    Hirai, T.3
  • 11
    • 0026872343 scopus 로고
    • Phase relationship in the Ti-Si-C system at high pressures
    • S.Sambasivan and W.T.Petuskey: "Phase relationship in the Ti-Si-C system at high pressures", J. Mater. Res., 7(1992) 1473-1479.
    • (1992) J. Mater. Res , vol.7 , pp. 1473-1479
    • Sambasivan, S.1    Petuskey, W.T.2
  • 12
    • 0030193863 scopus 로고    scopus 로고
    • Synthesis and characterization of a Remarkable Ceramic: Ti3SiC2
    • M.W.Barsoum and T.El-Raghy: "Synthesis and characterization of a Remarkable Ceramic: Ti3SiC2", J. Am. Ceram. Soc., 79(1996)1953-1956.
    • (1996) J. Am. Ceram. Soc , vol.79 , pp. 1953-1956
    • Barsoum, M.W.1    El-Raghy, T.2
  • 13
    • 0041779849 scopus 로고    scopus 로고
    • Materials design for the next generation thermal barrier coatings
    • D.R.Clarke and C.G.Levi: "Materials design for the next generation thermal barrier coatings", Annu. Rev. Mater. Res., 33(2003)383-417.
    • (2003) Annu. Rev. Mater. Res , vol.33 , pp. 383-417
    • Clarke, D.R.1    Levi, C.G.2
  • 15
    • 0036761593 scopus 로고    scopus 로고
    • Rapid synthesis of yttriapartially- stabilized zirconia films by metal-organic chemical vapor deposition
    • R.Tu, T.Kimura and T.Goto: "Rapid synthesis of yttriapartially- stabilized zirconia films by metal-organic chemical vapor deposition", Mater. Trans., 43(2002)2354-2356.
    • (2002) Mater. Trans , vol.43 , pp. 2354-2356
    • Tu, R.1    Kimura, T.2    Goto, T.3
  • 16
    • 7544234107 scopus 로고    scopus 로고
    • High-speed deposition of zirconia films by laserinduced plasma CVD
    • T.Goto: "High-speed deposition of zirconia films by laserinduced plasma CVD", Solid State Ionics, 172(2004)225-229.
    • (2004) Solid State Ionics , vol.172 , pp. 225-229
    • Goto, T.1
  • 17
    • 12944265099 scopus 로고    scopus 로고
    • High speed deposition of nanopore dispersed zirconia by CVD and improvement of thermal barrier performance
    • T.Goto, T.Kinura and R.Tu: "High speed deposition of nanopore dispersed zirconia by CVD and improvement of thermal barrier performance", J. Jpn. Soc. Powder Powder Metallugy, 51(2004)821-828.
    • (2004) J. Jpn. Soc. Powder Powder Metallugy , vol.51 , pp. 821-828
    • Goto, T.1    Kinura, T.2    Tu, R.3
  • 18
    • 0037906401 scopus 로고    scopus 로고
    • Rapid synthesis of yttria-stabilized zirconia films by laser chemical vapor deposition
    • T.Kimura and T.Goto: "Rapid synthesis of yttria-stabilized zirconia films by laser chemical vapor deposition", Mater. Trans., 44(2003)421-424.
    • (2003) Mater. Trans , vol.44 , pp. 421-424
    • Kimura, T.1    Goto, T.2
  • 19
    • 0004115497 scopus 로고    scopus 로고
    • Laser-CVD of microstructures
    • Springer
    • D.Bauerle: "Laser-CVD of microstructures", Laser Processing and Chemistry, Springer, (2000)337-360.
    • (2000) Laser Processing and Chemistry , pp. 337-360
    • Bauerle, D.1
  • 20
    • 0035568995 scopus 로고    scopus 로고
    • Laser chemical vapour deposition: Materials, modelling, and process control
    • C.Duty, D.Jean and W.J.Lackey: "Laser chemical vapour deposition: materials, modelling, and process control", Inter. Mater. Rev., 46(2001)271-287.
    • (2001) Inter. Mater. Rev , vol.46 , pp. 271-287
    • Duty, C.1    Jean, D.2    Lackey, W.J.3
  • 21
    • 33749991433 scopus 로고    scopus 로고
    • High-speed oxide coating by laser chemical vapor deposition and their nano-structure
    • T.Goto and T.Kimura: "High-speed oxide coating by laser chemical vapor deposition and their nano-structure", Thin Solid Films, 515(2006)46-52.
    • (2006) Thin Solid Films , vol.515 , pp. 46-52
    • Goto, T.1    Kimura, T.2
  • 22
    • 33847715146 scopus 로고    scopus 로고
    • Microstructures and electrical properties of Ru-C nano-composite films by PECVD
    • M.Sakata, T.Kimura and T.Goto: "Microstructures and electrical properties of Ru-C nano-composite films by PECVD", Mater. Trans., 48(2007)58-63.
    • (2007) Mater. Trans , vol.48 , pp. 58-63
    • Sakata, M.1    Kimura, T.2    Goto, T.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.