Low temperature deposition of SiC thin films on polymer surface by plasma CVD

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 484-489

  Anma, H ^a   Yoshimoto, Y ^a   Warashina, M ^a   Hatanaka, Y ^b  

^a Koito Manufacturing Co Ltd   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Cathode deposition; Polycarbonate; SiC thin films; Weatherability

Indexed keywords

CATHODES; LIGHT TRANSMISSION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCARBONATES; SILANES; SILICON CARBIDE; THERMAL EFFECTS; THIN FILMS; ULTRAVIOLET RADIATION; XENON;

CATHODE DEPOSITION METHOD; HEXAMETHYLDISILANE; LOW TEMPERATURE DEPOSITION; WEATHERABILITY;

PROTECTIVE COATINGS;

EID: 18144451047     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00127-1     Document Type: Article

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