Sub-10 nm crystalline silicon nanostructures by electron beam induced deposition lithography

Nanotechnology

Volumn 21, Issue 28, 2010, Pages

  Sychugov, I ^a   Nakayama, Y ^a   Mitsuishi, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL OXIDATION; CRYSTALLINE SILICONS; DIRECT ACCESS; ELECTRON BEAM-INDUCED DEPOSITION; GAS MOLECULES; METAL PATTERNS; MONOCRYSTALLINE SILICON; NANOSTRUCTURE SURFACE; QUANTUM DOT; QUANTUM EFFECTS; SEMICONDUCTOR NANOSTRUCTURES; SEMICONDUCTOR SUBSTRATE; SIZE RANGES; TOP-DOWN APPROACH;

ELECTRON BEAMS; NANOSTRUCTURES; QUANTUM ELECTRONICS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77954146155     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/28/285307     Document Type: Article

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