Noncovalent mechanism for the conformal metallization of nanostructured parylene films

Langmuir

Volumn 26, Issue 6, 2010, Pages 4382-4391

  Malvadkar, Niranjan A ^a   Sekeroglu, Koray ^a   Dressick, Walter J ^b   Demirel, Melik C ^a  

^a The Pennsylvania State University   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AMORPHOUS SURFACES; AQUEOUS SOLUTIONS; AROMATIC LIGANDS; CATALYTIC ACTIVITY; CO FILMS; ELECTROLESS METALLIZATION; FIB/SEM; LIGAND ADSORPTION; METAL DEPOSIT; METAL LAYER; METALLIZATIONS; NANO-POROUS; NANO-STRUCTURED; NANOROD ARRAYS; NON-COVALENT FUNCTIONALIZATION; NONCOVALENT; OBLIQUE ANGLES; PARYLENE FILM; PHYSISORBED; POLY(CHLORO-P-XYLYLENE); PRODUCTION OF HYDROGEN; PYRIDINE ADSORPTION; SEED LAYER; SI SUBSTRATES; SODIUM BOROHYDRIDES; TWO-LEVEL FACTORIAL DESIGN; X-RAY DIFFRACTION STUDIES;

ADSORPTION; CATALYST ACTIVITY; CHEMICALS REMOVAL (WATER TREATMENT); LIGANDS; METALLIC FILMS; METALLIZING; NANORODS; PALLADIUM; PALLADIUM COMPOUNDS; PYRIDINE; QUARTZ; SODIUM; SOLUTIONS; SUBSTRATES; VAPORS; X RAY DIFFRACTION;

COBALT;

EID: 77953770429     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la9034529     Document Type: Article

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