Determination of correct composition in nickel-phosphorus films by XPS angle resolved technique

Applied Surface Science

Volumn 217, Issue 1-4, 2003, Pages 163-169

  Sirtori, V ^a   Lombardi, L ^a   Cavallotti, P L ^b   Magagnin, L ^b  

^a Celestica Italia   (Italy)

^b POLITECNICO DI MILANO   (Italy)

Author keywords

Ion implantation; Nickel; Phosphorus; Sputtering; X ray photoelectron spectroscopy

Indexed keywords

BINDING ENERGY; COMPOSITION; ION IMPLANTATION; NICKEL COMPOUNDS; SPUTTERING; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE LAYERS;

THIN FILMS;

EID: 0037525402     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00531-2     Document Type: Article

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