Interaction of ultrathin nickel oxide films with single-crystal zirconia and alumina surfaces

Surface and Interface Analysis

Volumn 34, Issue 1, 2002, Pages 545-549

  Sygellou, L ^a   Zafeiratos, S ^a   Tsud, N ^b   Matolin, V ^b   Kennou, S ^a   Ladas, S ^a  

^a UNIVERSITY OF PATRAS   (Greece)

^b CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Nickel oxide; Sapphire; XPS XAES; Yttria stabilized ZrO2

Indexed keywords

ALUMINA; ANNEALING; ARGON; AUGER ELECTRON SPECTROSCOPY; NICKEL; SINGLE CRYSTALS; SURFACES; TEMPERATURE; ULTRATHIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA;

ARGON ION SPUTTERING; SAPPHIRE SUBSTRATE; ULTRATHIN NICKEL OXIDE FILMS;

INTERFACES (MATERIALS);

EID: 0036693085     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1357     Document Type: Conference Paper

References (13)