Three-dimensional imaging of pore structures inside low-κ dielectrics

Applied Physics Letters

Volumn 96, Issue 22, 2010, Pages

  Xin, Huolin L ^a   Ercius, Peter ^a,b   Hughes, Kevin J ^a   Engstrom, James R ^a   Muller, David A ^a  

^a Cornell University   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DARK-FIELD; ELLIPSOMETRIC POROSIMETRY; INTERCONNECTIVITY; LARGE PORES; LOG-NORMAL; LOW-DIELECTRIC CONSTANT FILM; PORE CONNECTIVITY; PORE MORPHOLOGY; QUANTITATIVE MEASUREMENT; THREE DIMENSIONAL IMAGING; THREE-DIMENSIONAL RECONSTRUCTION; TOMOGRAPHIC; TRANSMISSION ELECTRON; UPPER LIMITS;

COALESCENCE; DIELECTRIC MATERIALS; ELECTRIC IMPEDANCE TOMOGRAPHY; ELLIPSOMETRY; NORMAL DISTRIBUTION; PORE SIZE; SIZE DETERMINATION; SIZE DISTRIBUTION; SYSTEMATIC ERRORS;

THREE DIMENSIONAL;

EID: 77953557607     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3442496     Document Type: Article

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