New aspects of nano-meter structures of porous low-k films and their impacts on Cu/Low-k processes for 65 nm and beyond TEM tells What?

International Symposium on VLSI Technology, Systems, and Applications, Proceedings

Volumn , Issue , 2007, Pages

  Ogawa, Shinichi ^a   Shimada, Miyoko ^a   Shimanuki, Junichi ^b   Otsuka, Yuji ^c   Inoue, Yasuhide ^b   Hashimoto, Hideki ^c  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b NISSAN ARC LTD   (Japan)

^c TORAY RESEARCH CENTER INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; NANOSTRUCTURED MATERIALS; PERMITTIVITY; POROUS MATERIALS; TOMOGRAPHY; TRANSMISSION ELECTRON MICROSCOPY;

PLASMA PROCESSES; PORE STRUCTURES; POROUS LOW-K FILMS; TRENCH STRUCTURES;

THIN FILMS;

EID: 34548863348     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VTSA.2007.378952     Document Type: Conference Paper

References (9)

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5. M. Shimada et al., in Proc. 2005 IITC,p.88
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8. A. Matsushita et al., in Proc. 2003IITC, p.147,
9. R. F. Egerton, EELS in the Electron Microscope, section 4, (Plenum Press, New York) (1996)