Techniques for removal of contamination from EUVL mask without surface damage

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Singh, Sherjang ^a   Chen, Ssuwei ^a   Wähler, Tobias ^b   Jonckheere, Rik ^c   Liang, Ted ^d   Chen, Robert J ^d   Dietze, Uwe ^a  

^a HamaTech USA Inc   (United States)

^b IMEC vzw ^*  (Germany)

^c IMEC   (Belgium)

^d INTEL CORPORATION   (United States)

Author keywords

Capping layer integrity; contamination removal; EUV mask cleaning; surface restoration

Indexed keywords

AFM; CAPPING LAYER; CAPPING LAYER INTEGRITY; CLEANING METHODS; CONVENTIONAL METHODS; DEFECTIVITY; EUV LITHOGRAPHY; EUV MASK; REFLECTIVITY CHANGES; RU CAPPING LAYERS; SURFACE DAMAGES;

EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY; PHOTOMASKS; RESTORATION; SURFACES;

SURFACE CLEANING;

EID: 77953506557     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.847026     Document Type: Conference Paper

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