Study on surface integrity in photomask resist strip and final cleaning processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Singh, Sherjang ^a   Helbig, Stefan ^b   Dress, Peter ^b   Dietze, Uwe ^a  

^a HamaTech USA Inc   (United States)

^b HamaTech APE ^*  (Germany)

Author keywords

Capping layer; CD loss; Chrome loss; Cleaning; Double patterning; EUVL; Haze prevention; Ozone water; Photomask; Resist strip

Indexed keywords

CAPPING LAYER; CD LOSS; CHROME LOSS; DOUBLE-PATTERNING; EUVL; HAZE PREVENTION; RESIST STRIP;

ACIDS; DATA STORAGE EQUIPMENT; EXTREME ULTRAVIOLET LITHOGRAPHY; LOSS PREVENTION; NANOIMPRINT LITHOGRAPHY; OPTICAL PROPERTIES; OZONE; PHOTOMASKS; QUALITY ASSURANCE; RUTHENIUM; SULFURIC ACID; SURFACE CLEANING; SURFACES; TECHNOLOGICAL FORECASTING; ULTRAVIOLET DEVICES; WATER SUPPLY;

OZONE LAYER;

EID: 69949128118     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824254     Document Type: Conference Paper

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