Characterization of ruthenium thin films as capping layer for extreme ultraviolet lithography mask blanks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 1859-1866

  Yan, Pei Yang ^a   Spiller, Eberhard ^b   Mirkarimi, Paul ^b  

^a INTEL CORPORATION   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPPING LAYER; CHEMICAL DURABILITY; DAMAGE-FREE MASK PATTERNING; ION DEPOSITION SOURCE ENERGY;

AMORPHIZATION; COMPRESSIVE STRESS; CRYSTAL STRUCTURE; EXTREME ULTRAVIOLET LITHOGRAPHY; MICROSTRUCTURE; RUTHENIUM;

THIN FILMS;

EID: 37148999068     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2799963     Document Type: Article

References (16)

1. P. Y. Yan, G. Zhang, S. Chegwidden, E. Spiller, and P. Mirkarimi, Proc. SPIE 5256, 1281 (2003).
2. S. Bajt, H. Chapman, N. Nguyen, J. Alameda, J. Robinson, M. Malinowski, E. Gullikson, A. Aquila, C. Tarrio, and S. Grantham, Appl. Opt. 42, 5750 (2003).
3. P. Y. Yan, G. Zhang, E. Spiller, and P. Mirkarimi, Proc. SPIE 5446, 824 (2004).
4. P. Y. Yan, E. Siller, E. Gullickson, and S. Hill, Proc. SPIE 5992, 59923Z (2005).
5. Y. Kakutani, M. Niibe, H. Takase, S. Terashima, H. Kondo, S. Matsunari, T. Aoki, Y. Gomei, and Y. Fukuda, Proc. SPIE 5751, 1077 (2005).
6. S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. G. Edwards, Proc. SPIE 5751, 118 (2005).
7. Y. Du, C. J. Choi, G. Zhang, S. J. Park, P. Y. Yan, and K. H. Baik, Proc. SPIE 6283, 62833D-1 (2006).
8. G. Zhang, P. Y. Yan, T. Liang, Y. Du, P. Sanchez, S. J. Park, E. J. Lanzendorf, C. J. Choi, E. Y. Shu, A. R. Stivers, J. Farnsworth, K. Hsia, M. Chandhok, M. J. Leeson, and G. Vandentop, Proc. SPIE 6283, 62830G-1 (2006).
9. P. Mirkarimi, E. Spiller, S. L. Baker, V. Sperry, D. G. Stearns, and E. M. Gullikson, J. Microlithogr., Microfabr., Microsyst. 3, 139 (2004).
10. R. Randive, P. Mirkarimi, E. Spiller, A. Ma, P. Kearney, S. I. Han, S. C. Seo, T. Uno, and D. Krick, Fourth International Extreme Ultraviolet Lithography Symposium, San Diego, CA, 2005, http://www.sematech.org/meetings/archives/ litho/euvl/7470/index.htm
11. http://henke.lbl.gov/optical_constants/getdb2.html
12. P. Mirkarimi, Opt. Eng. (Bellingham) 38, 1246 (1999).
13. P. B. Mirkarimi, E. Spiller, S. L. Baker, D. G. Stearns, D. L. Olynick, F. Salmassi, J. A. Liddle, T. Liang, and A. R. Stivers, J. Nanosci. Nanotechnol. 6, 28 (2006).
14. P. B. Mirkarimi, E. Spiller, S. L. Baker, J. C. Robinson, T. Liang, A. R. Stivers, and S. J. Park, Fourth International Extreme Ultraviolet Lithography Symposium, San Diego, CA, 2005, http://www.sematech.org/meetings/archives/litho/ euvl/7470/index.htm
15. A. R. Stivers, T. Liang, M. Penn, B. Lieberman, G. Shelden, J. Folta, C. Larson, P. Mirkarimi, C. Walton, E. M. Gullikson, and M. Yi, Proc. SPIE 4889, 408 (2002).
16. E. Tejnil, E. M. Gullikson, and A. Stivers, Proc. SPIE 5567, 943 (2004).