Chemical durability studies of Ru-capped EUV mask blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Shimomura, Takeya ^a   Liang, Ted ^b  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b INTEL CORPORATION   (United States)

Author keywords

Cleaning; Defect free mask; EUV lithography; Ozonated water

Indexed keywords

ATOMIC-FORCE MICROSCOPIES; CAPPING LAYERS; CHEMICAL DURABILITIES; CLEANING EFFICIENCIES; CLEANING PROCESS; CLEANING REQUIREMENTS; DEFECT-FREE MASK; EUV LITHOGRAPHY; EUV MASK BLANKS; EUV MASKS; EUV REFLECTIVITIES; MASK STRUCTURES; MINIMAL EFFECTS; MULTI LAYERS; OZONATED WATER; RU CAPPING LAYERS; SURFACE DAMAGES; XPS;

ATOMIC SPECTROSCOPY; CHEMICAL CLEANING; DURABILITY; EXTREME ULTRAVIOLET LITHOGRAPHY; HYDROGEN; HYDROGEN PEROXIDE; PHOTOMASKS; REFLECTION; SULFURIC ACID; ULTRAVIOLET DEVICES;

SURFACE CLEANING;

EID: 62649116366     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.803065     Document Type: Conference Paper

References (6)

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3. E. Tejnil, E. M. Gullikson, and A. Stivers, "Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme-ultraviolet lithography," Proceedings of SPIE, Vol. 5567, 943, (2004).
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5. S. Yulin, N. Benoit, T. Feigl, N. Kaiser, M. Fang and M. Chandhok, "Mo/Si multilayers with enhanced TiO2- and RuO2-capping layers," Proceedings of SPIE, Vol. 6921, 692118 (2008).
6. S. Matsunari, T. Aoki, Y. Gomei, S. Terashima, H. Takase, M. Niibe and Y. Kakutani, "Lifetime estimation and improvement of capping layer on multi-layer mirror for EUV," 4th International EUVL Symposium, San Diego, November 7-9, 2005.