Influence of conditions of r.f. sputtering on chemical constitution and structure of PZT-type thin films

Integrated Ferroelectrics

Volumn 23, Issue 1, 1999, Pages 229-257

  Surowiak, Z ^a   Czekaj, D ^a   Bakirov, A A ^b   Dudkevich, V P ^b  

^a UNIVERSITY OF SILESIA   (Poland)

^b SOUTHERN FEDERAL UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CERAMIC MATERIALS; DEPOSITION; HOT PRESSING; LEAD COMPOUNDS; METALLOGRAPHIC MICROSTRUCTURE; PEROVSKITE; POLYCRYSTALLINE MATERIALS; SPUTTERING; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS FILM DEPOSITION; CHEMICAL CONSTITUTION; DISK CERAMICS; FERROELECTRIC THIN FILMS; STOICHIOMETRIC FILMS;

FERROELECTRIC MATERIALS;

EID: 0033296293     PISSN: 10584587     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1080/10584589908210152     Document Type: Article

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