Cu adhesion on tantalum and ruthenium surface: Density functional theory study

Journal of Applied Physics

Volumn 107, Issue 10, 2010, Pages

  Ding, Shao Feng ^a   Deng, Shao Ren ^a   Lu, Hai Sheng ^a   Jiang, Yu Long ^a   Ru, Guo Ping ^a   Zhang, David Wei ^a   Qu, Xin Ping ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION ABILITY; ADHESION LAYER; ADSORPTION ENERGIES; CHEMICAL INTERACTIONS; CU ATOMS; ELECTRON DENSITIES; FIRST-PRINCIPLES STUDY; GEOMETRICAL STRUCTURE; NITROGEN-DOPED; RU(0001);

ADHESION; ADSORPTION; AGGLOMERATION; DENSITY FUNCTIONAL THEORY; DESORPTION; DOPING (ADDITIVES); LATTICE MISMATCH; OXYGEN; RUTHENIUM;

TANTALUM;

EID: 77952985747     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3369443     Document Type: Article

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