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Volumn 112, Issue 26, 2008, Pages 9798-9802
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Ab initio molecular dynamics simulation on the aggregation of a Cu monolayer on a WN(001) surface
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Author keywords
[No Author keywords available]
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Indexed keywords
AB INITIO MOLECULAR DYNAMICS SIMULATION;
AB INITIO MOLECULAR DYNAMICS SIMULATIONS;
ACTIVATION BARRIERS;
ATOMIC LAYER DEPOSITION (ALD;
CLUSTER SIZES;
COPPER CLUSTERS;
COPPER FILMS;
DYNAMIC BEHAVIORS;
EXPERIMENTAL OBSERVATIONS;
FIRST-PRINCIPLES SIMULATIONS;
OPERATING TEMPERATURES;
ROOM TEMPERATURES;
THREE-DIMENSIONAL CLUSTERS;
ACTIVATION ENERGY;
ATOMIC LAYER DEPOSITION;
COPPER;
DYNAMICS;
ELECTRON ENERGY LEVELS;
MOLECULAR DYNAMICS;
NANOFLUIDICS;
PHYSICAL VAPOR DEPOSITION;
PULSED LASER DEPOSITION;
QUANTUM CHEMISTRY;
THREE DIMENSIONAL;
AGGLOMERATION;
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EID: 53549121686
PISSN: 19327447
EISSN: 19327455
Source Type: Journal
DOI: 10.1021/jp802979b Document Type: Article |
Times cited : (12)
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References (15)
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