Measurement of optical constants of Si and SiO2 from reflection electron energy loss spectra using factor analysis method

Journal of Applied Physics

Volumn 107, Issue 8, 2010, Pages

  Jin, H ^a   Shinotsuka, H ^a   Yoshikawa, H ^a   Iwai, H ^a   Tanuma, S ^a   Tougaard, S ^b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b UNIVERSITY OF SOUTHERN DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEX DIELECTRIC FUNCTIONS; EFFICIENT METHOD; ELECTRON ENERGY LOSS SPECTRUM; EMISSION ANGLE; ENERGY DEPENDENT; ENERGY LOSS FUNCTION; EXTINCTION COEFFICIENTS; FACTOR ANALYSIS; FACTOR ANALYSIS METHOD; INELASTIC MEAN FREE PATH; KRAMERS-KRONIG ANALYSIS; NEW APPROACHES; OSCILLATOR STRENGTHS; PRIMARY BEAM ENERGIES; QUANTITATIVE ANALYSIS; REAL PART; REFERENCE DATA; REFLECTION ELECTRON ENERGY LOSS SPECTROSCOPIES; SUM RULE;

DISSOCIATION; ELECTRIC FURNACES; ELECTRON ENERGY ANALYZERS; ELECTRON ENERGY LEVELS; ENERGY DISSIPATION; NUCLEAR INSTRUMENTATION; OPTICAL CONSTANTS; REELS; REFRACTIVE INDEX; SILICON; SILICON COMPOUNDS;

ELECTRON ENERGY LOSS SPECTROSCOPY;

EID: 77952393575     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3346345     Document Type: Article

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