Angular dependence of the surface excitation probability for medium energy electrons backscattered from Al and Si surfaces

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2388-2393

  Werner, Wolfgang S M ^a   Smekal, Werner ^a   Störi, Herbert ^a   Eisenmenger Sittner, Christopher ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AUGER ELECTRON SPECTROSCOPY; BACKSCATTERING; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON REFLECTION; ELECTRON SCATTERING; INTERFACES (MATERIALS); SENSITIVITY ANALYSIS; SILICON; SURFACE PHENOMENA; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE EXCITATIONS;

ELECTRON TRANSITIONS;

EID: 0035441759     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1385908     Document Type: Article

References (22)