Controlling deposition rates in an atmospheric pressure plasma system

Surface and Coatings Technology

Volumn 203, Issue 5-7, 2008, Pages 844-847

  Albaugh, John ^a   O'Sullivan, Caroline ^a   O'Neill, Liam ^a  

^a DOW CORNING CORPORATION   (United States)

Author keywords

Deposition; Plasma; Thin film

Indexed keywords

ABS RESINS; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CLIMATOLOGY; COATINGS; DEPOSITION; DEPOSITION RATES; JETS; METEOROLOGY; PLASMA ACCELERATORS; PLASMA DEVICES; PLASMA DIAGNOSTICS; PLASMA JETS; PLASMA SOURCES; PLASMA THEORY; PLASMAS; PLASTIC COATINGS; THICK FILMS;

AMBIENT PLASMAS; ATMOSPHERIC PRESSURE PLASMAS; COATING PROCESSES; CURING PROCESSES; DESIGNED EXPERIMENTS; GAS FLOWS; HEPTADECAFLUORODECYL ACRYLATES; IN-SITU; IR MEASUREMENTS; MACHINE PARAMETERS; PLASMA JET SYSTEMS; PLASMA POWERS; PLASMA SYSTEMS; POLYMERIC COATINGS; PRECURSOR FLOW RATES; PROCESS PARAMETERS; RIGID AND FLEXIBLE SUBSTRATES; SIGNIFICANT FACTORS;

PLASMA DEPOSITION;

EID: 55749101001     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.05.047     Document Type: Article

References (21)

1. Han L.M., and Timmons R.B. Chem. Mater. 10 (1998) 1422
2. Coulson S.R., Woodward I.S., Badyal J.P.S., Brewer S.A., and Willis C. Langmuir 16 (2000) 6287
3. Pierson H.O. Handbook of Chemical Vapour Deposition (1999), Noyes Publicatiosn, N.Y.
4. O'Neill L., O'Hare L.A., Leadley S.R., and Goodwin A.J. Chem. Vap. Depos. 11 (2005) 477
5. Babayan S.E., Jeong J.Y., Tu V.J., Park J., Selwyn G.S., and Hicks R.F. Plasma Sources Sci. Technol. 7 (1998) 286
6. Alexandrov S.E., and Hitchman M.L. Chem. Vap. Depos. 11 (2005) 457
7. Gheradi N., Martin S., and Massines F. J. Phys. D: Appl. Phys. 33 (2000) L104
8. Hodgkinson J.L., Sheel D.W., Yates H.M., and Pemble M.E. Plasma Process. Polym. 3 8 (2006) 597
9. Ward L.J., Schofield W.C.E., Badyal J.P.S., Goodwin A.J., and Merlin P.J. Chem. Mater. 15 (2003) 1466
10. Twomey B., Dowling D., Byrne G., O'Neill L., and O'Hare L.A. Plasma Process. Polym. 4 (2007) 450
11. Tatoulian M., and Arefi-Khonsari F. Plasma Process. Polym. 4 (2007) 360
12. O'Hare L.A., O'Neill L., and Goodwin A.J. Surf. Interface Anal. 38 (2006) 1519
13. O'Neill L., Shephard N., Leadley S.R., and O'Hare L.A. J. Adhes. 84 6 (2008) 562
14. Lide D.R. CRC Handbook of Chemistry and Physics 1999-2000: A Ready-Reference Book of Chemical and Physical Data. 81st edition (2000), CRC Press, Boca Raton, Florida
15. Albaugh J.D., O'Sullivan C., and O'Neill L. 51st Annual Technical Conference Proceedings- Society of Vacuum Coaters (2008) 26
16. Ward L.J., Schofield W.C.E., Badyal J.P.S., Goodwin A.J., and Merlin P.J. Langmuir 19 6 (2003) 2110
17. Heyse P., Dams R., Paulussen S., Houthoofd K., Janssen K., Jacobs P.A., and Sels B.F. Plasma Process. Polym. 4 (2007) 145
18. Lipp E.D., and Lee Smith A. In: Lee Smith A. (Ed). The Analytical Chemsitry of Silicones (1991), Wiley-Interscience, New york
19. www.glassproperties.com/refractive_index/.
20. Yasuda H. Plasma Polymerization (1985), Academic Press, New York, London
21. Coulson S.R., Woodward I.S., Badyal J.P.S., Brewer S.A., and Willis C. Chem. Mater. 12 (2000) 2031