The effect of N2 flow rate in He/O2/N2 on the characteristics of large area pin-to-plate dielectric barrier discharge

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 1-7, 2005, Pages

  Lee, Yong Hyuk ^a   Kyung, Se Jin ^a   Jeong, Chang Hyun ^a   Yeom, Geun Young ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Atmospheric pressure plasma; Corona discharge; DBD; He O2 N 2; OES

Indexed keywords

ATMOSPHERIC PRESSURE; CAPACITORS; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTRODES; ETCHING; FLAT PANEL DISPLAYS; HELIUM; OXYGEN; SPECTROSCOPIC ANALYSIS; SURFACE TREATMENT;

ATMOSPHERIC PRESSURE PLASMA; CORONA DISCHARGE; DIELECTRIC BARRIER DISCHARGES (DBD); HE/O2/N2; OPTICAL EMISSION SPECTROSCOPY (OES);

NITROGEN;

EID: 17444403245     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.L78     Document Type: Article

References (18)

1. S. Kanazawa, M. Kogoma, T. Moriwaki and S. Okazaki: J. Phys. D 21 (1988) 838.
2. N. K. Bibinov, A. A Fateev and K. Wiesemann: J. Phys. D 34 (2001) 1819.
3. Y. H. Lee, C. H. Yi, M. J. Chung and G. Y. Yeom: Surf. Coat. Tech. 146 (2001) 474.
4. C. H. Yi, Y. H. Lee and G. Y. Yeom: Surf. Coat. Tech. 171 (2003) 237.
5. F. Massines, A. Rabehi, P. Decomps, R. B. Gadri, P. Segur and C. Mayoux: J. Appl. Phys. 83 (1998) 2950.
6. S. Wang, V. Schulz-von der Gathen and H. F. Dobele: Appl. Phys. Lett. 83 (2003) 3272.
7. S. K. Dhali and I. Saradja: J. Appl. Phys. 69 (1991) 6319.
8. F. Massines, P. Segur, N. Gherardi, C. Khamphan and A. Richard: Surf. Coat. Tech. 174 (2003) 8.
9. H. E. Wagner, R. Brandenburg, K. V. Kozlov, A. Sonnenfeld, P. Michel and J. F. Behnke: Vacuum 71 (2003) 417.
10. J. S. Chang, P. A. Lawless and T. Yamamoto: IEEE Transactions on Plasma Sci. 19 (2001) 1152.
11. J. R. Roth: Industrial Plasma Engineering (Institute of Physics Publishing, Bristol, 2001).
12. S. C. Brown: Basic Data of Plasma Physics (American Vacuum Society Classics, USA, 1994).
13. M. Schmidt and K. H. Schoenbach: Low Temperature Plasma Physics (WILEY-VCH, Germany, 2001).
14. A. B. Rakshit et al: J. Phys. B 11 (1978) 4237.
15. I. A. Kossyi, A. Y. Kostinsky, A. A. Matveyev and V. O. Silakov: Plasma Sources Sci. Technol. 1 (1992) 207.
16. Y. B. Golubovskii, V. A. Maiorov, J. Behnke and J. F. Behnke: J. Phys. D 36 (2003) 39.
17. B. F. Gordiets, C. M. Ferreira, V. L. Guerra, J. M. A. Loureiro, J. Nahorny, D. Pagnon, M. Touzeau and M. Vialle: IEEE Transactions on Plasma Science 23 (1995) 750.
18. N. Gherardi, G. Gouda, E. Gat, A. Ricard and F. Massines: Plasma Sources Sci. Technol. 9 (2000) 340.