Comparing deposition properties in an atmospheric pressure plasma system operating in uniform and nonuniform modes

IEEE Transactions on Plasma Science

Volumn 37, Issue 6 PART 1, 2009, Pages 961-969

  Twomey, Barry ^a   Dowling, Denis P ^a   Byrne, Gerry ^a   Graham, William G ^b   Schaper, Lucas F ^b   Della Croce, Damian ^b   Hynes, Alan ^c   O'Neill, Liam ^c  

^a UNIVERSITY COLLEGE DUBLIN   (Ireland)

^b QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

^c Dow Corning Plasma Solutions   (Ireland)

Author keywords

CVD; Optical imaging; Plasma properties; Thin films

Indexed keywords

ATMOSPHERIC PRESSURE PLASMAS; CVD; DEPOSITED COATINGS; DEPOSITION PROPERTIES; FILAMENTARY MODE; HOMOGENEOUS DIELECTRICS; HOMOGENEOUS PLASMA; LIQUID AEROSOLS; MICRODISCHARGE; MODE OF OPERATIONS; NONUNIFORM; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL IMAGING; PLASMA PROPERTIES; TETRA-ETHYL-ORTHO-SILICATE; TIME-RESOLVED;

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; GAS PERMEABLE MEMBRANES; HELIUM; OPTICAL IMAGE STORAGE; OPTICAL PROPERTIES; OXYGEN; PLASMA DEPOSITION; PLASMA DEVICES; PLASMA SOURCES; THIN FILMS;

ELECTRIC DISCHARGES;

EID: 67650324671     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2009.2015226     Document Type: Article

References (33)

1. A. Grill, Cold Plasma in Materials Fabrication. New York: IEEE Press, 1993.
2. J. R. Roth, Industrial Plasma Engineering, vol. 2. Bristol, U.K.: IOP Publ. Ltd, 2001.
3. F. F. Chen, "Radiofrequency plasma sources for semiconductor processing," in Advanced Plasma Technology, R. d'Agostino, P. Favia, Y. Kawai, H. Ikegami, N. Sato, and F. Arefi-Khonsari, Eds. Weinheim, Germany: Wiley-VCH, 2008.
4. L. Chu, W. Knoll, and R. Forch, "Biologically multifunctional surfaces using plasma polymerization methods," Plasma Process. Polym., vol. 3, no. 6/7, pp. 498-505, Aug. 2006.
5. G. Czeremuszkin, M. Latreche, M. R. Wertheimer, and S. A. S. da Silva, "Ultrathin silicon-compound barrier coatings for polymeric packaging materials: An industrial perspective," Plasmas Polym., vol. 6, no. 1/2, pp. 107-120, 2001.
6. R. Shishoo, Ed., Plasma Technologies for Textiles. Boca Raton, FL: CRC Press, 2007.
7. M. E. Ryan, A. M. Hynes, and J. P. S. Badyal, "Pulsed plasma polymerization of maleic anhydride," Chem. Mater., vol. 8, no. 1, pp. 37-42, Jan. 1996.
8. L. M. Han, R. B. Timmons, D. Bogdal, and J. Pielichowski, "Ring retention via pulsed plasma polymerization of heterocyclic aromatic compounds," Chem. Mater., vol. 10, no. 5, pp. 1422-1429, Apr. 1998.
9. S. E. Alexandrov and M. L. Hitchman, "Chemical vapor deposition enhanced by atmospheric pressure non-thermal non-equilibrium plasmas," Chem. Vap. Depos., vol. 11, no. 11/12, p. 457, 2005.
10. A. Schutze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn, and R. F. Hicks, "The atmospheric-pressure plasma jet: A review and comparison to other plasma sources," IEEE Trans. Plasma Sci., vol. 26, no. 6, pp. 1685-1694, Dec. 1998.
11. Y. Sawada, S. Ogawa, and M. Kogoma, "Synthesis of plasma-polymerized tetraethoxysilane and hexamethyldisiloxane films prepared by atmospheric pressure glow discharge," J. Phys. D, Appl. Phys., vol. 28, no. 8, pp. 1661-1669, Aug. 1995.
12. S. Kanazawa, M. Kogoma, T. Moriwaki, and S. J. Okazaki, "Stable glow plasma at atmospheric pressure," J. Phys. D, Appl. Phys., vol. 21, no. 5, pp. 838-840, May 1988.
13. S. Kanazawa, M. Kogoma, S. Okazaki, and T. Moriwaki, "Glow plasma treatment at atmospheric pressure for surface modification and film deposition," Nucl. Instrum. Methods Phys. Res., vol. 37/38, pp. 842-845, Feb. 1989.
14. L. J. Ward, W. C. E. Schofield, J. P. S. Badyal, A. J. Goodwin, and P. J. Merlin, "Atmospheric pressure plasma deposition of structurally well-defined polyacrylic acid films," Chem. Mater., vol. 15, no. 7, pp. 1466-1469, Mar. 2003.
15. x films," Langmuir, vol. 19, no. 6, pp. 2110-2114, Feb. 2003.
16. F. Massines and G. Gouda, "A comparison of polypropylene-surface treatment by filamentary, homogeneous and glow discharges in helium at atmospheric pressure," J. Phys. D, Appl. Phys., vol. 31, no. 24, pp. 3411-3420, Dec. 1998.
17. F. Massines, P. Segur, N. Gherardi, C. Khamphan, and A. Ricard, "Physics and chemistry in a glow dielectric barrier discharge at atmospheric pressure: Diagnostics and modelling," Surf. Coat. Technol., vol. 174/175, pp. 8-14, Sep./Oct. 2003.
18. F. Massines, A. Rabehi, P. Decomps, R. Gadri, P. Sègur, and C. Mayoux, "Experimental and theoretical study of a glow discharge at atmospheric pressure controlled by dielectric barrier," J. Appl. Phys., vol. 83, no. 6, pp. 2950-2957, Mar. 1998.
19. D. Della Croce, L. Schaper, W. G. Graham, L. O'Neill, and A. Hynes, "Electrical and time-resolved imaging studies of an industrial scale atmospheric pressure glow discharge system for processing polymer film," Plasma Sources Sci. Technol. submitted for publication.
20. B. Twomey, D. Dowling, G. Byrne, L. O'Neill, and L.-A. O'Hare, "Properties of siloxane coatings deposited in a reel-to-reel atmospheric pressure plasma system" Plasma Process. Polym., vol. 4, no. S1, pp. S450-S454, Apr. 2007.
21. B. Twomey, M. Rahman, G. Byrne, A. Hynes, L.-A. O'Hare, L. O'Neill, and D. Dowling, "Effect of plasma exposure on the chemistry and morphology of aerosol-assisted, plasma-deposited coatings," Plasma Process. Polym., vol. 5, no. 8, pp. 737-744, Oct. 2008.
22. D. K. Owens and R. C. Wendt, "Estimation of the surface free energy of polymers," J. Appl. Polym. Sci., vol. 13, no. 8, pp. 1741-1747, 1969.
23. H. Hillborg and U.W. Gedde, "Hydrophobicity recovery of polydimethyl-siloxane after exposure to corona discharges," Polymer vol. 39, p. 1991, 1998.
24. H. G. Tompkins and W. A. McGahan, Spectroscopic Ellipsometry and Reflectometry. New York: Wiley, 1999.
25. 2) atmospheric pressure plasma," J. Colloid Interface Sci. vol. 295, no. 2, pp. 409-416, Mar. 2006.
26. H. Yasuda, "Glow discharge polymerization," J. Polym. Sci., Macromol. Rev., vol. 16, no. 1, pp. 199-293, 1981.
27. S. E. Babayan, J. Y. Jeong, V. J. Tu, J. Park, G. S. Selwyn, and R. F. Hicks, "Deposition of silicon dioxide films with an atmospheric-pressure plasma jet," Plasma Sources Sci. Technol., vol. 7, no. 3, pp. 286-288, Aug. 1998.
28. 4 and spectroscopic studies on the formation of glasses via silica gels," Vibr. Spectrosc., vol. 9, no. 3, pp. 293-304, Sep. 1995.
29. χ like thin films from a mixture of HMDSO and oxygen by low pressure and DBD discharges to improve the corrosion behaviour of steel," Plasma Process. Polym., vol. 4, no. S1, pp. S562-S567, Apr. 2007.
30. A. Ramamoorthy, M. Rahman, D. A. Mooney, J. M. Don MacElroy, and D. P. Dowling, "Thermal stability studies of atmospheric plasma deposited siloxane films deposited on Vycor glass," Surf. Coat. Technol., vol. 202, no. 17, pp. 4130-4136, May 2008.
31. C. Hollenstein, A. A. Howling, C. Courteille, D. Magni, S. M. Scholz, G. M. W. Kroesen, N. Simons, W. de Zeeuw, and W. Schwarzenbach, "Silicon oxide particle formation in RF plasmas investigated by infrared absorption spectroscopy and mass spectrometry," J. Phys. D, Appl. Phys., vol. 31, no. 1, pp. 74-84, Jan. 1998.
32. R. Thyen, A. Weber, and C. P. Klages, "Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure," Surface and Coatings Technol., vol. 97, no. 1-3, p. 426, 1997.
33. J. P. Borra, "Nucleation and aerosol processing in atmospheric pressure electrical discharges: Powders production, coatings and filtration," J. Phys. D, Appl. Phys., vol. 39, no. 2, pp. R19-R54, Jan. 2006.