Nanomechanical response of indented multilayered nanofilms with size effect

Current Nanoscience

Volumn 6, Issue 2, 2010, Pages 173-177

  Wang, Tong Hong ^a   Fang, Te Hua ^b   Kang, Shao Hui ^b  

^a ADVANCED SEMICONDUCTOR ENGINEERING INC   (Taiwan)

^b NATIONAL FORMOSA UNIVERSITY   (Taiwan)

Author keywords

Hall Petch effect; Hardness; Multilayer; Nanoindentation; Size effect

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BLENDING; ELASTIC MODULI; GRAIN BOUNDARIES; HARDNESS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; ION BEAMS; MAGNETRON SPUTTERING; MULTILAYERS; NANOINDENTATION; TRANSMISSION ELECTRON MICROSCOPY;

AUGER ELECTRON SPECTROMETERS; FOCUSED ION BEAM MACHINING; HALL PETCH RELATIONSHIP; HALL-PETCH EFFECTS; NANOINDENTATION LOAD-DISPLACEMENT CURVES; NANOMECHANICAL RESPONSE; RADIO FREQUENCY MAGNETRON SPUTTERING; SIZE EFFECTS;

ALUMINUM;

ALUMINUM; NANOFILM; TITANIUM;

ARTICLE; AUGER ELECTRON SPECTROSCOPY; MICROWAVE OVEN; MOLECULAR MECHANICS; PRIORITY JOURNAL; RADIOFREQUENCY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 77951112648     PISSN: 15734137     EISSN: None     Source Type: Journal    
DOI: 10.2174/157341310790945641     Document Type: Article

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