Importance of contact radius for substrate-independent property measurement of thin films

Materials Research Society Symposium - Proceedings

Volumn 522, Issue , 1998, Pages 27-32

  Hay, J L ^a   O'Hern, M E ^a   Oliver, W C ^a  

^a Applied Nano Metrics   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTOPLASTICITY; HARDNESS; MECHANICAL VARIABLES MEASUREMENT; SUBSTRATES;

HERTZIAN CONTACT;

THIN FILMS;

EID: 0032306727     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)