ToF-SIMS depth profiling of organic films: A comparison between single-beam and dual-beam analysis

Journal of Physical Chemistry C

Volumn 114, Issue 12, 2010, Pages 5565-5573

  Brison, J ^a   Muramoto, S ^a   Castner, David G ^a,b  

^a University of Washington   (United States)

^b UNIVERSITY OF WASHINGTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPTH PROFILE; DEPTH RESOLUTION; DIMENSIONLESS PARAMETERS; DUAL-BEAM; DUAL-BEAM DEPTH PROFILING; FLUENCES; HIGH ENERGY; ION FLUENCES; LOWER ENERGIES; MINIMAL DAMAGE; MOLECULAR SIGNALS; ORGANIC FILMS; ORGANIC SYSTEMS; SINGLE-BEAM; STATIC SIMS; STEADY-STATE REGIONS; TOF SIMS;

ENERGY MANAGEMENT; ETCHING; HIGH ENERGY PHYSICS; SECONDARY ION MASS SPECTROMETRY;

DEPTH PROFILING;

EID: 77950287627     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp9066179     Document Type: Article

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