-
2
-
-
0022129236
-
-
d'Agostino R, Cramarossa F, de Benedictis S, Fracassi F and Laska J 1985 Plasma Chem. Plasma Process. 5 239
-
(1985)
Plasma Chem. Plasma Process.
, vol.5
, pp. 239
-
-
D'Agostino, R.1
Cramarossa, F.2
De Benedictis, S.3
Fracassi, F.4
Laska, J.5
-
4
-
-
24644466721
-
-
Henriques J, Villeger S, Levaton J, Nagai J, Santana S, Amorim J and Ricard A 2005 Surf. Coat. Technol. 200 814
-
(2005)
Surf. Coat. Technol.
, vol.200
, pp. 814
-
-
Henriques, J.1
Villeger, S.2
Levaton, J.3
Nagai, J.4
Santana, S.5
Amorim, J.6
Ricard, A.7
-
9
-
-
34548662858
-
-
Latrasse L, Sadeghi N, Lacoste A, Bes A and Pelletier J 2007 J. Phys. D: Appl. Phys. 40 5177
-
(2007)
J. Phys. D: Appl. Phys.
, vol.40
, pp. 5177
-
-
Latrasse, L.1
Sadeghi, N.2
Lacoste, A.3
Bes, A.4
Pelletier, J.5
-
10
-
-
18744397876
-
-
de Poucques L, Imbert J C, Boisse-Laporte C, Vaina P, Bretagne J, Teule-Gay L and Touzeau M 2005 Plasma Sources Sci. Technol. 14 321
-
(2005)
Plasma Sources Sci. Technol.
, vol.14
, pp. 321
-
-
De Poucques, L.1
Imbert, J.C.2
Boisse-Laporte, C.3
Vaina, P.4
Bretagne, J.5
Teule-Gay, L.6
Touzeau, M.7
-
11
-
-
0036649069
-
-
Ricard A, Nouvellon C, Konstantinidis S, Dauchot J P, Wautelet M and Hecq M 2002 J. Vac. Sci. Technol. A 20 1488
-
(2002)
J. Vac. Sci. Technol. A
, vol.20
, pp. 1488
-
-
Ricard, A.1
Nouvellon, C.2
Konstantinidis, S.3
Dauchot, J.P.4
Wautelet, M.5
Hecq, M.6
-
12
-
-
65949098658
-
-
Hancock G, van Helden J H, Peverall R, Ritchie G A D and Walker R J 2009 Appl. Phys. Lett. 94 201110
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 201110
-
-
Hancock, G.1
Van Helden, J.H.2
Peverall, R.3
Ritchie, G.A.D.4
Walker, R.J.5
-
13
-
-
66149086199
-
-
Lang N, Röpcke J, Zimmermann H, Steinbach A and Wege S 2009 J. Phys.: Conf. Ser. 157 012007
-
(2009)
J. Phys.: Conf. Ser.
, vol.157
, pp. 012007
-
-
Lang, N.1
Röpcke, J.2
Zimmermann, H.3
Steinbach, A.4
Wege, S.5
-
15
-
-
0001222690
-
-
Fan W Y, Knewstubb P F, Kaning M, Mechold L, Ropke J and Davies P B 1999 J. Phys. Chem. A 103 4118
-
(1999)
J. Phys. Chem. A
, vol.103
, pp. 4118
-
-
Fan, W.Y.1
Knewstubb, P.F.2
Kaning, M.3
Mechold, L.4
Ropke, J.5
Davies, P.B.6
-
17
-
-
0001534442
-
-
Engeln R, Letourneur K G Y, Boogaarts M G H, van de Sanden M C M and Schram D C 1999 Chem. Phys. Lett. 310 405
-
(1999)
Chem. Phys. Lett.
, vol.310
, pp. 405
-
-
Engeln, R.1
Letourneur, K.G.Y.2
Boogaarts, M.G.H.3
Van De Sanden, M.C.M.4
Schram, D.C.5
-
20
-
-
0020497002
-
-
Hata N, Matsuda A, Tanaka K, Kajiyma K, Moro N and Sajiki K 1983 J. Appl. Phys. 22 1
-
(1983)
J. Appl. Phys.
, vol.22
, pp. 1
-
-
Hata, N.1
Matsuda, A.2
Tanaka, K.3
Kajiyma, K.4
Moro, N.5
Sajiki, K.6
-
23
-
-
0346979035
-
-
Hamers E A G, van Sark WG J H M, Bezemer J, Goedheer W J and van der Weg W F 1998 Int. J. Mass Spectrom. Ion Process. 173 91
-
(1998)
Int. J. Mass Spectrom. Ion Process.
, vol.173
, pp. 91
-
-
Hamers, E.A.G.1
Van Sark, W.G.J.H.M.2
Bezemer, J.3
Goedheer, W.J.4
Van Der Weg, W.F.5
-
30
-
-
63749124525
-
-
Gaboriau F, Cvelbar U, Mozetic M, Erradia A and Rouffet B 2009 J. Phys. D: Appl. Phys. 42 055204
-
(2009)
J. Phys. D: Appl. Phys.
, vol.42
, pp. 055204
-
-
Gaboriau, F.1
Cvelbar, U.2
Mozetic, M.3
Erradia, A.4
Rouffet, B.5
-
34
-
-
0033740862
-
-
Baeva M, Luo X, Pfelzer B, Repsilber T and Uhlenbusch J 2000 Plasma Sources Sci. Technol. 9 128
-
(2000)
Plasma Sources Sci. Technol.
, vol.9
, pp. 128
-
-
Baeva, M.1
Luo, X.2
Pfelzer, B.3
Repsilber, T.4
Uhlenbusch, J.5
-
35
-
-
0036859999
-
-
Mazouffre S, Bakker I, Vankan P, Engeln R and Schram D C 2002 Plasma Sources Sci. Technol. 11 439
-
(2002)
Plasma Sources Sci. Technol.
, vol.11
, pp. 439
-
-
Mazouffre, S.1
Bakker, I.2
Vankan, P.3
Engeln, R.4
Schram, D.C.5
-
40
-
-
4243179716
-
-
Landé A 1921 Z. Phys. 5 231-41
-
(1921)
Z. Phys.
, vol.5
, pp. 231-241
-
-
Landé, A.1
-
64
-
-
0029356696
-
-
Gordiets B, Ferreira C M, Guerra V, Loureiro J, Nahorny J, Pagnon D, Touzeau M and Vialle M 1995 IEEE Trans. Plasma Sci. 23 750
-
(1995)
IEEE Trans. Plasma Sci.
, vol.23
, pp. 750
-
-
Gordiets, B.1
Ferreira, C.M.2
Guerra, V.3
Loureiro, J.4
Nahorny, J.5
Pagnon, D.6
Touzeau, M.7
Vialle, M.8
-
65
-
-
84956248659
-
-
Nahorny J, Ferreira C M, Gordiets B, Pagnon D, Touzeau M and Vialle M 1995 J. Phys. D: Appl. Phys. 28 738-47
-
(1995)
J. Phys. D: Appl. Phys.
, vol.28
, pp. 738-747
-
-
Nahorny, J.1
Ferreira, C.M.2
Gordiets, B.3
Pagnon, D.4
Touzeau, M.5
Vialle, M.6
-
68
-
-
56449088884
-
-
Doležal V, Mrzkov M, Dvokřá P, Kudrle V and Tálský A 2005 Acta Phys. Slovaca 55 435-9
-
(2005)
Acta Phys. Slovaca
, vol.55
, Issue.5
, pp. 435-439
-
-
Doležal, V.1
Mrzkov, M.2
Dvořák, P.3
Kudrle, V.4
Tálský, A.5
-
70
-
-
0242332607
-
-
Kudrle V, Tálský A, Kudláč A, Křápek V and Janač J 2000 Czech. J. Phys. (Suppl. S3) 50 305-8
-
(2000)
Czech. J. Phys. (Suppl. S3)
, vol.50
, pp. 305-308
-
-
Kudrle, V.1
Tálský, A.2
Kudláč, A.3
Křápek, V.4
Janča, J.5
-
74
-
-
0039348508
-
-
Johnson N M, Walker J, Dolond C M, Winer K and Street R A 1989 Appl. Phys. Lett. 54 1872
-
(1989)
Appl. Phys. Lett.
, vol.54
, pp. 1872
-
-
Johnson, N.M.1
Walker, J.2
Dolond, C.M.3
Winer, K.4
Street, R.A.5
|