In situ monitoring of plasma etch processes with a quantum cascade laser arrangement in semiconductor industrial environment

Journal of Physics: Conference Series

Volumn 157, Issue , 2009, Pages

  Lang, N ^a   Ropcke J ^a   Zimmermann, H ^a   Steinbach, A ^b   Wege, S ^b  

^a INP GREIFSWALD   (Germany)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 66149086199     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/157/1/012007     Document Type: Article

References (11)

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